Study of nonradiative recombination centers in GaAs:N δ-doped superlattices structures revealed by below-gap excitation light

Md. Dulal Haque, N. Kamata, A. T. Touhidul Islam, M. Julkarnain, S. Yagi, H. Yaguchi, Y. Okada
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Abstract

Nonradiative recombination (NRR) centers in GaAs:N $\delta$-doped superlattices (SLs) grown by molecular beam epitaxy (MBE) has been investigated by two-wavelength excited photoluminescence (TWEPL) method for conduction band scheme. The PL intensity of $E_{-}$ band of the samples with lower nitrogen (N) concentration (0.317% N) initially increases after addition of below-gap excitation (BGE) light over above-gap excitation (AGE) light and then quenches at higher BGE density and energy, while that of GaAs (e-A°) emission of GaAs layers decreases monotonically. For sample with higher N concentration (1.18% N) both the $E _{-}$ band and GaAs (e-A°) emission decreases monotonically with enhancing BGE density and degree of decreasing of PL intensity is higher compared to the low N concentration sample. The quenching of PL intensity indicates the existence of NRR centers in GaAs layers and GaAs:N $\delta$-doped SL region. The recombination models have been proposed for explaining the results from the experiments.
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隙下激发光显示GaAs:N δ掺杂超晶格结构中非辐射复合中心的研究
用双波长激发光致发光(TWEPL)方法研究了分子束外延(MBE)生长的GaAs:N $\delta$掺杂超晶格(SLs)中的非辐射复合(NRR)中心。低氮(N)浓度(0.317% N)样品的$E_{-}$带的PL强度在加隙下激发(BGE)光后先增加,然后在更高的BGE密度和能量下猝灭,而GaAs层的GaAs (e-A°)发射的PL强度单调降低。对于高N浓度(1.18% N)样品,随着BGE密度的增加,$E _{-}$波段和GaAs (E - a°)发射均单调下降,且PL强度的下降程度高于低N浓度样品。PL强度的猝灭表明在GaAs层和GaAs:N $\delta$掺杂的SL区存在NRR中心。本文提出了重组模型来解释实验结果。
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