{"title":"Monitoring of heavy metals in as-implanted SIMOX with surface photovoltage","authors":"L. Jastrzebski, R. Soydan","doi":"10.1109/SOI.1988.95402","DOIUrl":null,"url":null,"abstract":"Summary form only given. Surface photovoltage (SPV) was used successfully to measure the iron concentration in as-implanted SIMOX (separation by implanted oxygen) materials. An initial correlation has been established between diffusion lengths measured on the back of SIMOX wafers and Fe concentration measured by SIMS (secondary ion mass spectrometry) and spark source in as-implanted SIMOX films. The SPV measurements are quick, nondestructive, and do not require any additional sample preparation. Therefore, they could be used easily as a quality control method to monitor heavy metals in as-implanted SIMOX layers.<<ETX>>","PeriodicalId":391934,"journal":{"name":"Proceedings. SOS/SOI Technology Workshop","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings. SOS/SOI Technology Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOI.1988.95402","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
Summary form only given. Surface photovoltage (SPV) was used successfully to measure the iron concentration in as-implanted SIMOX (separation by implanted oxygen) materials. An initial correlation has been established between diffusion lengths measured on the back of SIMOX wafers and Fe concentration measured by SIMS (secondary ion mass spectrometry) and spark source in as-implanted SIMOX films. The SPV measurements are quick, nondestructive, and do not require any additional sample preparation. Therefore, they could be used easily as a quality control method to monitor heavy metals in as-implanted SIMOX layers.<>
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