Why are low-temperature MBE grown semiconductors important for an all-solid-state ultrafast laser technology?

U. Keller
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引用次数: 1

Abstract

We generate pulses from nanoseconds to 10 fs by varying the semiconductor saturable absorber and laser cavity design. In the long pulse regime with pulses as short as 180 ps, we rely on passive Q-switching. In the picosecond regime, we use the fast saturable absorber modelocking technique, and in the femtosecond regime, the semiconductor saturable absorber stabilizes soliton modelocking. In all cases, we benefit from the large design freedom of the antiresonant Fabry-Perot saturable absorber (A-FPSA) concept using low-temperature MBE growth to artificially adjust the physical parameters such as recovery times, saturation fluence, saturation intensity, insertion loss and modulation depth.
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为什么低温MBE生长半导体对全固态超快激光技术很重要?
通过改变半导体可饱和吸收体和激光腔的设计,我们产生了从纳秒到10秒的脉冲。在短至180ps的长脉冲状态下,我们依靠被动q开关。在皮秒范围内,我们使用了快速饱和吸收器模型锁定技术,在飞秒范围内,我们使用半导体饱和吸收器稳定孤子模型锁定。在所有情况下,我们都受益于抗谐振法布里-珀罗饱和吸收器(A-FPSA)概念的大设计自由度,该概念使用低温MBE生长来人为调整物理参数,如恢复时间、饱和通量、饱和强度、插入损耗和调制深度。
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