Effect of deposition rate on the DUV/VUV reflectance of MgF2protected aluminum mirrors with e-beam evaporation

Tong-tong Wang, Jin-song Gao
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引用次数: 2

Abstract

Aluminum mirrors were freshly fabricated under optimum conditions protected with MgF2 at various deposition rates which evaporated by e-beam. All the samples were deposited on fine polished fused silica substrate. The reflectance results were measured by Mcpherson Vuvas2000 spectrometer in DUV/VUV spectral region from 150nm to 350nm. The highest reflectance is chosen to 210nm, and the point of 160nm is also very important for the project, so the results of two points are detailed presented. The highest average reflectance is about 86.76% with the MgF2 deposition rate at 1.2nm/s. The effects of aging on the reflectance of the MgF2 protected aluminum mirrors are discussed.
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沉积速率对电子束蒸发mgf2保护铝镜DUV/VUV反射率的影响
以不同沉积速率的MgF2为保护层,在最佳条件下制备了铝反射镜。所有的样品都被沉积在精细抛光的熔融二氧化硅衬底上。利用Mcpherson Vuvas2000光谱仪在150 ~ 350nm的DUV/VUV光谱范围内测量反射率。选择210nm为最高反射率,而160nm这一点对于本项目也很重要,因此详细介绍了两点的结果。当MgF2沉积速率为1.2nm/s时,平均反射率最高,约为86.76%。讨论了老化对MgF2保护铝反射镜反射率的影响。
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