Magneto-transport studies in AlGaN/GaN MODFETs

J. Antoszewski, M. Gracey, J. Dell, L. Faraone, G. Parish, Y. Wu, Utkarsh Mishra
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Abstract

In order to characterise the transport properties of the 2DEG in AlGaN/GaN modulation doped field effect transistors, channel magnetoresistance has been measured in the magnetic field range 0-12 T, the temperature range 25-300 K and gate bias range +0.5 V to -2.0 V. Assuming that the 2DEG provides the dominant contribution to the total conductivity, a one carrier fitting procedure has been applied to extract electron mobility and carrier density at each particular value of temperature and gate bias. Consequently, the mobility versus 2DEG density has been obtained for each different temperature. The qualitative analysis of these profiles and comparison with theoretical predictions published by others suggests that for 2DEG densities below 7/spl times/10/sup 12/ cm/sup -2/ the electron mobility is limited by impurity scattering, whereas for densities above this level and up to 1/spl times/10/sup 13/ cm/sup -2/ the electron mobility is controlled by AlGaN/GaN interface roughness.
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AlGaN/GaN modfet的磁输运研究
为了表征AlGaN/GaN调制掺杂场效应晶体管中2DEG的输运特性,在0 ~ 12 T的磁场范围、25 ~ 300 K的温度范围和+0.5 V ~ -2.0 V的栅极偏置范围内测量了沟道磁阻。假设2DEG对总电导率的贡献占主导地位,则应用单载流子拟合程序来提取每个特定温度和栅极偏置值下的电子迁移率和载流子密度。因此,得到了在不同温度下的迁移率与2g密度的关系。对这些谱图进行定性分析并与其他人发表的理论预测进行比较表明,对于密度低于7/spl倍/10/sup 12/ cm/sup -2/的2DEG,电子迁移率受杂质散射的限制,而对于密度高于此水平和高达1/spl倍/10/sup 13/ cm/sup -2/的电子迁移率受AlGaN/GaN界面粗糙度的控制。
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