Ultrafast and Accurate Proximity Effect Correction of Large-Scale Electron Beam Lithography based on FMM and SaaS

Abstract

This paper proposes a fast proximity effect correction (PEC) methodology based on fast multipole method (FMM), to simultaneously achieve high calculation speed and accuracy. It is shown that the proposed methodology has both linear computational time complexity, $O(N)$, where $N$ is number of pixels, and linear parallelization speedup on multiple central processing unit (CPU) cores. These linear scaling scenarios are ideal traits for PEC of large-scale electron beam lithography (EBL). The proposed methodology has been implemented using C++ and OpenMP programming tools, and freely available via the Software-as-a-Service (SaaS) mode (http://hnupecsvl.qicp.vip).