Persistent photoconductivity in SIMOX films

Santos Mayo, J. Lowney, Peter Roitman, Donald B. Novotny
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Abstract

Photoinduced transient spectroscopy (PITS) was used to measure the persistent photoconductive (PPC) response in film resistors fabricated on two different commercial n-type SIMOX (separation by implantation of oxygen) wafers. A broadband, single-shot, flashlamp-pumped dye-laser pulse was used to photoexcite interband electrons in the film, and the decay of the induced excess carrier population was measured at temperatures in the 60-220 K range. The post-illumination conductivity transients observed show PPC signals exhibiting a nonexponential character. They were recorded for periods of time up to 30 s at constant temperature. Presented are the excess conductivity in SIMOX film annealed in nitrogen at 1300 degrees C for 6 h and the hole-trap volume density at the conductive-film-buried-silicon interface.<>
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SIMOX薄膜的持续光导电性
采用光致瞬态光谱法(PITS)测量了在两种不同的n型SIMOX(氧注入分离)晶圆上制备的薄膜电阻器的持续光导(PPC)响应。利用宽带、单次闪光灯抽运的染料激光脉冲光激发薄膜中的带间电子,并在60-220 K范围内测量了诱导的多余载流子种群的衰减。观察到的光照后电导率瞬变显示PPC信号具有非指数特征。他们在恒温下记录了长达30秒的时间。给出了在氮气中1300℃退火6 h的SIMOX薄膜的过量电导率和导电膜埋硅界面处的空穴阱体积密度。
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The influence of emitter efficiency on single transistor latch in silicon-on-insulator MOSFETs Low-field charge injection in SIMOX buried oxides The effect of high field stress on the capacitance/voltage characteristics of buried insulators formed by oxygen implantation Polysilicon thin film transistors with field-plate-induced drain junction for both high-voltage and low-voltage applications Persistent photoconductivity in SIMOX films
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