A threshold pulse width for electromigration under pulsed stress conditions

T. Noguchi, K. Hatanaka, K. Maeguchi
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引用次数: 7

Abstract

Pulsed-current-induced electromigration failure was studied under various repetition frequencies and current densities. Self-joule-heating of the conductors during stressing was monitored directly by detecting the infrared intensity emitted from the conductor. It was found that there is a critical pulse width for electromigration under pulsed stress conditions which depend on the peak current density and substrate temperature. This fact suggests that a continuous force is needed to cause Al ions to migrate. When a pulse width is sufficiently short, Al ions cannot move and settle in new unstable sites.<>
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脉冲应力条件下电迁移的阈值脉冲宽度
在不同的重复频率和电流密度下,研究了脉冲电流引起的电迁移失效。通过检测导体发出的红外强度,直接监测了导体在受力过程中的自焦耳加热。研究发现,在脉冲应力条件下,电迁移存在一个临界脉宽,这取决于峰值电流密度和衬底温度。这一事实表明,需要一个持续的力来引起铝离子的迁移。当脉冲宽度足够短时,Al离子不能移动并定居在新的不稳定位置。
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