S. Yajima, T. Nakano, K. Sadachi, Y. Ikura, H. Miura, A. Tomozawa
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引用次数: 0
Abstract
During the drastic product change from memory devices to discrete devices, we have made various technical improvements in photolithography processing corresponding to its design characteristics, as follows: (1) establishment of fine gate processing technology; (2) optimization of throughput and processing accuracy using new photoresist processing customized for each step; and (3) establishment of flexible stepper application methods aimed at products-change-free production. Consequently, we have obtained the following beneficial results: (1) processing of 0.25 /spl mu/m discrete devices has been set up without KrF lithography; (2) a 198% improvement in stepper throughput has been achieved; and (3) a 58% reduction of waiting time has been obtained.
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