{"title":"Computer-aided recipe generation for LPCVD reactors","authors":"K.-K. Lin, C. Spanos","doi":"10.1109/ASMC.1990.111209","DOIUrl":null,"url":null,"abstract":"A computer-aided-design (CAD) system which has been developed to assist the process engineer in choosing the best compromise between product and equipment performance is described. A formal, systematic methodology that facilities the task of recipe design for low pressure chemical-vapor-deposition (LPCVD) reactors is discussed. Recipe generation via interactive response surface exploration and automatic recipe generation via numerical optimization are discussed.<<ETX>>","PeriodicalId":158760,"journal":{"name":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1990.111209","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A computer-aided-design (CAD) system which has been developed to assist the process engineer in choosing the best compromise between product and equipment performance is described. A formal, systematic methodology that facilities the task of recipe design for low pressure chemical-vapor-deposition (LPCVD) reactors is discussed. Recipe generation via interactive response surface exploration and automatic recipe generation via numerical optimization are discussed.<>
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