Modeling and simulation of oxygen precipitation in Si: precipitate-point defect interactions and influence of hydrogen

S. Senkader, G. Hobler, C. Schmeiser
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Abstract

In this work we present recent model developments which describes the precipitation of oxygen and the formation of stacking faults simultaneously in Czochralski-silicon wafers using rate- and Fokker-Planck equations. We have improved the model to consider the influence of vacancies on precipitation in addition that of self interstitials. A partitioning between vacancies and self interstitials is obtained by assuming that the system always seeks its minimum energy configuration. We additionally report our attempt to model the influence of hydrogen on oxygen precipitation.
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Si中氧析出的建模与模拟:析出点缺陷相互作用及氢的影响
在这项工作中,我们介绍了最近的模型发展,该模型使用速率方程和福克-普朗克方程同时描述了氧的沉淀和层错的形成。我们改进了模型,除了考虑自间隙对降水的影响外,还考虑了空位对降水的影响。通过假设系统总是寻求其最小能量配置,获得了空位和自间隙之间的划分。我们还报告了我们试图模拟氢对氧沉淀的影响。
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