Realization of high efficiency 4H-SiC IMPATT diode using optimized doping steps

G. Dash, J. Pradhan, S. K. Swain, S. R. Pattanaik
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引用次数: 1

Abstract

The electric field and width of the avalanche region are vital while determining the performance of an IMPATT diode. In an attempt to optimize the same a new doping pattern in the form of doping steps is introduced in the avalanche zone and its effects on the terahertz characteristics of a 4H-SiC IMPATT Diode are explored. It is exciting to observe a conversion efficiency of 17.24 % from the IMPAT T diode with the proposed doping steps.
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利用优化掺杂步骤实现高效率4H-SiC IMPATT二极管
电场和雪崩区的宽度是决定IMPATT二极管性能的关键因素。为了优化这一特性,在雪崩区引入了一种新的掺杂模式,并探讨了其对4H-SiC IMPATT二极管太赫兹特性的影响。令人兴奋的是,通过提出的掺杂步骤,IMPAT T二极管的转换效率达到了17.24%。
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