Analytical and compact modelling of the I-MOS (impact ionization MOS)

F. Mayer, T. Poiroux, G. Le Carval, L. Clavelier, S. Deleonibus
{"title":"Analytical and compact modelling of the I-MOS (impact ionization MOS)","authors":"F. Mayer, T. Poiroux, G. Le Carval, L. Clavelier, S. Deleonibus","doi":"10.1109/ESSDERC.2007.4430935","DOIUrl":null,"url":null,"abstract":"The Impact Ionization MOSFET (I-MOS) is a potential candidate for the post-CMOS era, allowing very sharp subthreshold slopes, down to a few mV/dec. For the first time, an analytical model is developed for this new kind of device. In the first part, the analytical model is explained and compared with TCAD results. The second part deals with the compact modeling of the I-MOS, allowing simulations of inverters.","PeriodicalId":103959,"journal":{"name":"ESSDERC 2007 - 37th European Solid State Device Research Conference","volume":"89 5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ESSDERC 2007 - 37th European Solid State Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDERC.2007.4430935","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12

Abstract

The Impact Ionization MOSFET (I-MOS) is a potential candidate for the post-CMOS era, allowing very sharp subthreshold slopes, down to a few mV/dec. For the first time, an analytical model is developed for this new kind of device. In the first part, the analytical model is explained and compared with TCAD results. The second part deals with the compact modeling of the I-MOS, allowing simulations of inverters.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
I-MOS(冲击电离MOS)的分析与紧凑建模
冲击电离MOSFET (I-MOS)是后cmos时代的潜在候选者,允许非常陡峭的亚阈值斜率,低至几mV/dec。本文首次建立了这种新型装置的解析模型。第一部分对分析模型进行了说明,并与TCAD结果进行了比较。第二部分涉及I-MOS的紧凑建模,允许逆变器的仿真。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
1T-capacitorless bulk memory: Scalability and signal impact Anisotropy of electron mobility in arbitrarily oriented FinFETs Self-aligned μTrench phase-change memory cell architecture for 90nm technology and beyond Critique of high-frequency performance of carbon nanotube FETs Analytical and compact modelling of the I-MOS (impact ionization MOS)
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1