Bingyang Li, Kangping Wang, Hongkeng Zhu, Xu Yang, Laili Wang
{"title":"Parasitic Capacitances Characterization of Double-Sided Cooling Power Module Based on GaN Devices","authors":"Bingyang Li, Kangping Wang, Hongkeng Zhu, Xu Yang, Laili Wang","doi":"10.1109/WiPDAAsia49671.2020.9360259","DOIUrl":null,"url":null,"abstract":"The parasitic capacitances of a novel double-sided cooling structure of GaN power module are analyzed in this paper. Due to the additional top ceramic substrate of the structure, parasitic capacitances become more complex. By analysis, gate-source parasitic capacitance and gate-drain parasitic capacitance of all GaN devices and drain-source parasitic capacitance of upper GaN device of half bridge circuit are less than 1% of the corresponding intrinsic capacitances. However, the drain-source parasitic capacitance (14% of Coss) of bottom GaN device of half bridge circuit increases by 30% compared with traditional single-sided cooling module, which is acceptable since the thermal resistance of this structure is about halved.","PeriodicalId":432666,"journal":{"name":"2020 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","volume":"99 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/WiPDAAsia49671.2020.9360259","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
The parasitic capacitances of a novel double-sided cooling structure of GaN power module are analyzed in this paper. Due to the additional top ceramic substrate of the structure, parasitic capacitances become more complex. By analysis, gate-source parasitic capacitance and gate-drain parasitic capacitance of all GaN devices and drain-source parasitic capacitance of upper GaN device of half bridge circuit are less than 1% of the corresponding intrinsic capacitances. However, the drain-source parasitic capacitance (14% of Coss) of bottom GaN device of half bridge circuit increases by 30% compared with traditional single-sided cooling module, which is acceptable since the thermal resistance of this structure is about halved.