Selective Deposition of Hafnium Oxide Nano-Thin Films on OTS Patterned Si

Abstract

The patterning of thin films is of considerable scientific and technological interest. Various ways to obtain micro/nano patterns of thin films have been thoroughly investigated. Soft lithography is the method to make micro/nano size patterns and structures simply using organic materials without involving high energy. In particular, microcontact printing (μCP) is a very convenient, nonphotolithographic technique that can generate patterned features of self-assembled monolayers (SAMs) on both planar and nonplanar surfaces. Moreover, the μCP technique shows that hydrophobic patterns with micro/nano dimensions can be formed on hydrophilic surfaces. In this study, we carried out the selective deposition of HfO2nano-thin films on Si