New method for temperature-dependent thermal resistance and capacitance accurate extraction in high-voltage DMOS transistors

C. Anghel, N. Hefyene, Renaud Gillon, M. Tack, Michel Declercq, Adrian M. Ionescu
{"title":"New method for temperature-dependent thermal resistance and capacitance accurate extraction in high-voltage DMOS transistors","authors":"C. Anghel, N. Hefyene, Renaud Gillon, M. Tack, Michel Declercq, Adrian M. Ionescu","doi":"10.1109/IEDM.2003.1269183","DOIUrl":null,"url":null,"abstract":"This work reports on the self-heating-effect (SHE) characterization of high-voltage (HV) DMOSFETs and a simple yet accurate extraction methodology of the equivalent thermal impedance of the device (thermal resistance, R/sub TH/, and capacitance, C/sub TH/). Systematic pulsed-gate experiments are used to study the influence of pulse duration and duty factor on device SHE and optimal extraction conditions. It is found that in 100 V DMOSFETs, the SHE is cancelled by using pulses with duration shorter than 2 /spl mu/s and duty factors lower than 1:100. The new extraction method uses dedicated extraction plots exploiting the gradual canceling of SHE with pulse duration and a new analytical modeling including the temperature dependence of RTH, is validated. For the first time, we report on the temperature dependence of RTH, from 25/spl deg/C up to 150/spl deg/C, in both saturation and quasi-saturation regions of DMOS, which is shown to be a quasi-linear yet significant function of the device internal temperature. Moreover, another new result is a power low-dependent thermal capacitance, as suggested by our experiments. Finally, SPICE simulations are used to validate the proposed method, and, demonstrate that a thermal-dependent thermal resistance model is highly critical for accurate advanced simulation of HV DMOS ICs.","PeriodicalId":344286,"journal":{"name":"IEEE International Electron Devices Meeting 2003","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"16","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE International Electron Devices Meeting 2003","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2003.1269183","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 16

Abstract

This work reports on the self-heating-effect (SHE) characterization of high-voltage (HV) DMOSFETs and a simple yet accurate extraction methodology of the equivalent thermal impedance of the device (thermal resistance, R/sub TH/, and capacitance, C/sub TH/). Systematic pulsed-gate experiments are used to study the influence of pulse duration and duty factor on device SHE and optimal extraction conditions. It is found that in 100 V DMOSFETs, the SHE is cancelled by using pulses with duration shorter than 2 /spl mu/s and duty factors lower than 1:100. The new extraction method uses dedicated extraction plots exploiting the gradual canceling of SHE with pulse duration and a new analytical modeling including the temperature dependence of RTH, is validated. For the first time, we report on the temperature dependence of RTH, from 25/spl deg/C up to 150/spl deg/C, in both saturation and quasi-saturation regions of DMOS, which is shown to be a quasi-linear yet significant function of the device internal temperature. Moreover, another new result is a power low-dependent thermal capacitance, as suggested by our experiments. Finally, SPICE simulations are used to validate the proposed method, and, demonstrate that a thermal-dependent thermal resistance model is highly critical for accurate advanced simulation of HV DMOS ICs.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
高压DMOS晶体管温度相关热阻和电容精确提取的新方法
这项工作报告了高压(HV) dmosfet的自热效应(SHE)特性,以及该器件等效热阻抗(热阻R/sub TH/和电容C/sub TH/)的简单而准确的提取方法。通过系统的脉冲门实验,研究了脉冲持续时间和占空因子对器件SHE的影响以及最佳提取条件。研究发现,在100 V dmosfet中,使用持续时间小于2 /spl mu/s且占空比小于1:100的脉冲可以抵消SHE。新的提取方法利用了SHE随脉冲持续时间逐渐抵消的专用提取图,并验证了包含RTH温度依赖性的新的分析模型。我们首次报道了RTH的温度依赖性,从25/spl°C到150/spl°C,在DMOS的饱和和准饱和区域,这被证明是器件内部温度的准线性但重要的函数。此外,另一个新的结果是功率低依赖的热电容,正如我们的实验所表明的那样。最后,SPICE仿真验证了所提出的方法,并证明了热相关的热阻模型对于HV DMOS集成电路的精确高级仿真至关重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Statistical simulations to inspect and predict data retention and program disturbs in flash memories Fin-channel-array transistor (FCAT) featuring sub-70nm low power and high performance DRAM The integration of proton bombardment process into the manufacturing of mixed-signal/RF chips A highly manufacturable low power and high speed HfSiO CMOS FET with dual poly-Si gate electrodes An 8F/sup 2/ MRAM technology using modified metal lines
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1