MOVPE growth of InGaAs on InP using tertiarybutylarsine

M. Abdalla, D. Kenneson, W. Powazinik
{"title":"MOVPE growth of InGaAs on InP using tertiarybutylarsine","authors":"M. Abdalla, D. Kenneson, W. Powazinik","doi":"10.1109/ICIPRM.1990.202996","DOIUrl":null,"url":null,"abstract":"The growth by low-pressure metalorganic vapor phase epitaxy (MOVPE) of lattice-matched InGaAs on InP substrates using tertiarybutylarsine (TBA) as the arsenic source is reported. The grown layers were uniform in composition and are consistently n-type with low background carrier concentration (2-3*10/sup 15//cm/sup 3/). Room temperature mobility as high as 11200 cm/sup 2//V-s with a corresponding 77 K mobility of 57000 cm/sup 2//V-s was measured. Photoluminescence (20 K) gave a strong narrow peak (FWHM=3.1 meV) with no evidence of carbon incorporation.<<ETX>>","PeriodicalId":138960,"journal":{"name":"International Conference on Indium Phosphide and Related Materials","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1990.202996","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

The growth by low-pressure metalorganic vapor phase epitaxy (MOVPE) of lattice-matched InGaAs on InP substrates using tertiarybutylarsine (TBA) as the arsenic source is reported. The grown layers were uniform in composition and are consistently n-type with low background carrier concentration (2-3*10/sup 15//cm/sup 3/). Room temperature mobility as high as 11200 cm/sup 2//V-s with a corresponding 77 K mobility of 57000 cm/sup 2//V-s was measured. Photoluminescence (20 K) gave a strong narrow peak (FWHM=3.1 meV) with no evidence of carbon incorporation.<>
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叔丁基larsin在InP上生长InGaAs的MOVPE
报道了以叔丁基larsine (TBA)为砷源,采用低压金属有机气相外延(MOVPE)在InP衬底上生长晶格匹配InGaAs。生长层组成均匀,均为n型,背景载流子浓度低(2-3*10/sup 15//cm/sup 3/)。室温迁移率高达11200 cm/sup 2//V-s,对应的77 K迁移率为57000 cm/sup 2//V-s。光致发光(20 K)有一个强窄峰(FWHM=3.1 meV),没有碳掺入的证据。
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