Two-dimensional electron gas density in high Al content Al/sub x/Ga/sub 1-x/N/GaN double heterostructure

Y. Kong, Y.D. Zheng, C. Zhou, Y. Deng, S. Gu, B. Shen, R. Zhang, Y. Shi, P. Han, R. Jiang
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Abstract

Al content in Al/sub x/Ga/sub 1-x/N/GaN double heterostructure (DH) is improved high up to x=1 by using a compressively strained GaN quantum well (QW) layer. By solving the coupled Schrodinger and Poisson equations self-consistently, we investigate the two-dimensional electron gas (2DEG) distributions and sheet densities in Al/sub x/Ga/sub 1-x/N/GaN DHs. Comparing to the 2DEG in Al/sub 0.5/Ga/sub 0.5/N/GaN single heterostructure (SH), the 2DEG sheet density in a comparable AlN/GaN/Al/sub 0.5/Ga/sub 0.5/N DH is nearly doubled from 2.31/spl times/10/sup 13/cm/sup -3/ to 4.47 /spl times/ 10/sup 13/cm/sup -3/, mainly owing to the additional piezoelectric polarization in the GaN QW. It is also shown that 2DEG in the GaN QW is increased with increasing the Al content of the top barrier due to the stronger polarization effect and large conduction band offset at the Al,Ga/sub 1-x/N/GaN interface. Increasing the lower barrier thickness will reduce the 2DEG density in the GaN QW while the 2DEG at the lower Al/sub y/Ga/sub 1-y/N/GaN interface is increased, making the total 2DEG density almost a constant.
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高Al含量Al/sub -x/ Ga/sub - 1-x/N/GaN双异质结构中的二维电子气体密度
在Al/sub x/Ga/sub 1-x/N/GaN双异质结构(DH)中,采用压缩应变GaN量子阱(QW)层可将Al含量提高到x=1。通过自洽求解耦合薛定谔方程和泊松方程,研究了Al/sub -x/ Ga/sub - 1-x/N/GaN DHs中的二维电子气体(2DEG)分布和片密度。与Al/sub 0.5/Ga/sub 0.5/N/GaN单异质结构(SH)中的2DEG相比,AlN/GaN/Al/sub 0.5/Ga/sub 0.5/N单异质结构(SH)中的2DEG片密度从2.31/spl次/10/sup 13/cm/sup -3/增加到4.47 /spl次/10/sup 13/cm/sup -3/,增加了近一倍,这主要是由于GaN QW中增加了压电极化。由于Al,Ga/sub 1-x/N/GaN界面的极化效应更强,导带偏移更大,GaN QW中的2DEG随顶势垒Al含量的增加而增加。增加下位垒厚度会降低GaN量子阱中的2DEG密度,而增加Al/sub -y/ Ga/sub - 1-y/N/GaN界面下的2DEG密度,使总2DEG密度几乎保持不变。
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