Measurement of MMIC gate temperature using infrared and Thermoreflectance thermography

J. Ling, A. Tay, K. F. Choo, W. Chen, D. Kendig
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引用次数: 5

Abstract

Thermal characterization of high power microwave devices is important for determining their reliability. Exceeding the optimal temperature will have a detrimental effect on the performance and reliability of these devices. In this paper, the temperature a power amplifier (PA) Monolithic Microwave Integrated Circuit (MMIC) was measured using the traditional Infrared (IR) thermography technique and an emerging technique called Thermoreflectance (TR) thermography. The measured results were compared to those calculated using finite element analysis (FEA). It was found that temperatures measured using TR thermography agreed very well with FEA results, whereas temperatures measured using IR thermography did not. This could be attributed to the presence of reflective and low emissivity surfaces on the PA MMIC and the inadequate spatial resolution of the IR camera.
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利用红外和热反射热成像技术测量MMIC栅极温度
高功率微波器件的热特性是决定其可靠性的重要因素。超过最佳温度将对这些设备的性能和可靠性产生不利影响。本文采用传统的红外(IR)热成像技术和新兴的热反射(TR)热成像技术对功率放大器(PA)单片微波集成电路(MMIC)的温度进行了测量。实测结果与有限元分析(FEA)计算结果进行了比较。发现用TR热像仪测量的温度与FEA结果非常吻合,而用IR热像仪测量的温度却没有。这可能归因于在PA MMIC上存在反射和低发射率表面以及红外相机的空间分辨率不足。
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