Physics and high speed devices

A. Levi, R. Nottenburg, B. Jalali, A. Cho, M. Panish
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引用次数: 1

Abstract

It is shown how an understanding of the physics of nonequilibrium electron transport in III-V semiconductors can usefully be applied to determining the limits of n-p-n InP/In/sub 0.53/Ga/sub 0.47/As heterostructure bipolar transistor device performance. For example, it is seen that nonequilibrium transport in In/sub 0.53/Ga/sub 0.47/As improves static transistor characteristics such as current gain and minimum lateral dimensions. In addition, the fastest bipolar transistors make use of high velocity Gamma -valley nonequilibrium electron transport in In/sub 0.53/Ga/sub 0.47/As. A thin, highly-doped base with an impurity concentration p>10/sup 20/ cm/sup -3/ has a negligible base transit time and collector transit delay dominates the intrinsic response. Ultra-high-speed heterostructure bipolar transistors perform best with small signals and low collector voltages.<>
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物理和高速设备
本文展示了对III-V半导体中非平衡电子输运的物理理解如何有效地应用于确定n-p-n InP/ in /sub 0.53/Ga/sub 0.47/As异质结构双极晶体管器件性能的极限。例如,可以看到in /sub 0.53/Ga/sub 0.47/As中的非平衡输运改善了静态晶体管的特性,如电流增益和最小横向尺寸。此外,最快的双极晶体管利用In/sub 0.53/Ga/sub 0.47/As的高速γ -谷非平衡电子输运。当杂质浓度p>10/sup / 20/ cm/sup -3/时,高掺杂的薄碱基传输时间可以忽略不计,集电极传输延迟主导本征响应。超高速异质结构双极晶体管在信号小、集电极电压低的情况下表现最好。
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