InGaP/InGaAs dual-channel transistor

H. Chuang, C. Uang, S. Cheng, Chun-Yuan Chen, P. Lai, C. Kao, Y. Tsai, W. Hsu, Wen-Chau Liu
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Abstract

An interesting InGaP/InGaAs heterostructure field-effect transistor utilizing dual /spl delta/-doped quantum wells as double channels is studied and demonstrated. The employed dual /spl delta/-doped quantum wells and InGaP layer provide good carrier confinement and Schottky behavior, respectively. Good device performances including higher turn-on and breakdown voltages, high and linear transconductance and RF properties are obtained. For a 1 /spl times/ 100 /spl mu/m device, turn-on voltage of 1.74 V, maximum output current of 499 mA/mm, and maximum transconductance of 162 mS/mm with 303 mA/mm broad operation regime are obtained. The microwave properties of f/sub T/ and f/sub max/ are 16 and 32.3 GHz, respectively. Furthermore, even the device is operated at higher temperature regime (>400K), insignificant degradations of DC and RF performances are observed.
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InGaP/InGaAs双通道晶体管
研究并演示了一种利用双/spl δ /掺杂量子阱作为双通道的InGaP/InGaAs异质结构场效应晶体管。所采用的双/spl δ /掺杂量子阱和InGaP层分别具有良好的载流子约束和肖特基行为。良好的器件性能,包括更高的导通和击穿电压,高和线性跨导和射频性能。对于1 /spl倍/ 100 /spl mu/m的器件,导通电压为1.74 V,最大输出电流为499 mA/mm,最大跨导为162 mS/mm,宽工作范围为303 mA/mm。f/sub T/和f/sub max/的微波特性分别为16 GHz和32.3 GHz。此外,即使器件在更高的温度下工作(>400K),也观察到直流和射频性能的轻微下降。
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