{"title":"SOI technology outlook for sub-0.25 /spl mu/m CMOS, challenges and opportunities","authors":"B. Davari, H. Hovel, G. Shahidi","doi":"10.1109/SOI.1993.344614","DOIUrl":null,"url":null,"abstract":"In this paper, the outlook for the SOI technology in the sub-0.25 /spl mu/m CMOS regime is discussed. The key challenges and opportunities for the SOI technology to become a main stream semiconductor technology are presented.<<ETX>>","PeriodicalId":308249,"journal":{"name":"Proceedings of 1993 IEEE International SOI Conference","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 1993 IEEE International SOI Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOI.1993.344614","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 11
Abstract
In this paper, the outlook for the SOI technology in the sub-0.25 /spl mu/m CMOS regime is discussed. The key challenges and opportunities for the SOI technology to become a main stream semiconductor technology are presented.<>
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