High Speed ($\boldsymbol{f}_{3-\boldsymbol{d}\boldsymbol{B}}$ above 10 GHz) Photo Detection at Two-micron-wavelength Realized by GeSn/Ge Multiple-quantum-well Photodiode on a 300 mm Si Substrate

Shengqiang Xu, Wei Wang, Yi-Chiau Huang, Yuan Dong, S. Masudy‐Panah, Hong Wang, X. Gong, Y. Yeo
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引用次数: 1

Abstract

High speed photo detection at two-micron-wavelength has been achieved with a GeSn/Ge multiple-quantum-well (MQW) photodiode (PD), demonstrating a 3-dB bandwidth $(f_{3-dB})$ above 10 GHz for the first time. The device layer stack was grown on a standard 300 mm (001) Si substrate using RPCVD, showing potential for large-scale integration. Radio frequency (RF) characterization was performed using $2- \mu\mathrm{m}$ RF optical measurement setup. To our knowledge, this is also the first PDs on Si with direct RF measurement to quantitatively confirm the high speed functionality at $2\ \mu \mathrm{m}$.
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300 mm Si衬底上GeSn/Ge多量子阱光电二极管实现的2微米波长高速($\boldsymbol{f}_{3-\boldsymbol{d}\boldsymbol{B}}$ 10 GHz以上)光检测
利用GeSn/Ge多量子阱(MQW)光电二极管(PD)实现了两微米波长的高速光检测,首次展示了10ghz以上的3db带宽$(f_{3-dB})$。利用RPCVD在标准300 mm (001) Si衬底上生长器件层堆栈,显示出大规模集成的潜力。使用$2- \mu\ mathm {m}$ RF光学测量装置进行射频(RF)表征。据我们所知,这也是第一个具有直接射频测量的硅上pd,以定量确认在$2\ \mu \ mathm {m}$的高速功能。
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