{"title":"A new simulation method of ion implantation","authors":"Xiaokang Shi, M. Yul, Huihui Jil, Ru Huang, Xing Zhang, Jinyu Zhang","doi":"10.1109/IWJT.2004.1306864","DOIUrl":null,"url":null,"abstract":"Efficient simulations of ion implantation are very important to ultra shallow junction technology. In this paper, a new splitting method is developed, based on the quantitative description and sensitivity analysis of statistical noise. A series of formulas are deduced and some disadvantages of existing splitting methods are pointed out.","PeriodicalId":342825,"journal":{"name":"The Fourth International Workshop on Junction Technology, 2004. IWJT '04.","volume":"210 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Fourth International Workshop on Junction Technology, 2004. IWJT '04.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IWJT.2004.1306864","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Efficient simulations of ion implantation are very important to ultra shallow junction technology. In this paper, a new splitting method is developed, based on the quantitative description and sensitivity analysis of statistical noise. A series of formulas are deduced and some disadvantages of existing splitting methods are pointed out.
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