Next generation coating technologies for low-cost electronics manufacturing

S. Bagen, G. Gibson, C. Newquist, H. Sago
{"title":"Next generation coating technologies for low-cost electronics manufacturing","authors":"S. Bagen, G. Gibson, C. Newquist, H. Sago","doi":"10.1109/IEMT.1996.559790","DOIUrl":null,"url":null,"abstract":"Extrusion coating and extrude-and-spin coating have been developed to significantly reduce the costs associated with the application of polymer films such as photoresists, dielectrics and color filter materials. These technologies are shown to reduce process fluid utilization by 75-95% as compared to conventional spin coating. Extrusion coating is readily scaled to accommodate increasingly larger square or rectangular substrates with high throughput. A wide variety of extrusion-coated films ranging from 300 /spl Aring/ to greater than 150 /spl mu/m thick have been demonstrated on substrates up to 600 mm in size. Typical film thickness uniformity is +/-3%. The extrusion coater system was shown to produce pinhole-free coatings with particle counts meeting or exceeding industry standards. Extrude-and-spin coating has been successfully demonstrated on 370/spl times/470 mm rectangular display glass substrates with film thickness uniformities of less than +/-3%. This technology is also being developed for processing round substrates, such as silicon wafers.","PeriodicalId":177653,"journal":{"name":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","volume":"37 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nineteenth IEEE/CPMT International Electronics Manufacturing Technology Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEMT.1996.559790","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

Extrusion coating and extrude-and-spin coating have been developed to significantly reduce the costs associated with the application of polymer films such as photoresists, dielectrics and color filter materials. These technologies are shown to reduce process fluid utilization by 75-95% as compared to conventional spin coating. Extrusion coating is readily scaled to accommodate increasingly larger square or rectangular substrates with high throughput. A wide variety of extrusion-coated films ranging from 300 /spl Aring/ to greater than 150 /spl mu/m thick have been demonstrated on substrates up to 600 mm in size. Typical film thickness uniformity is +/-3%. The extrusion coater system was shown to produce pinhole-free coatings with particle counts meeting or exceeding industry standards. Extrude-and-spin coating has been successfully demonstrated on 370/spl times/470 mm rectangular display glass substrates with film thickness uniformities of less than +/-3%. This technology is also being developed for processing round substrates, such as silicon wafers.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
低成本电子制造的下一代涂层技术
挤出涂层和挤出旋转涂层的发展大大降低了与聚合物薄膜(如光刻胶、电介质和滤色材料)应用相关的成本。与传统的旋转涂层相比,这些技术可以减少75-95%的工艺流体利用率。挤压涂层很容易缩放,以适应越来越大的方形或矩形基材,具有高吞吐量。各种各样的挤压涂层薄膜,厚度从300 /spl μ m到大于150 /spl μ m,已经在尺寸达600毫米的基材上得到了证明。典型的膜厚均匀度为+/-3%。该挤出涂布机系统生产的无针孔涂层颗粒数达到或超过行业标准。在370/spl次/470 mm矩形显示玻璃基板上成功地展示了挤出旋转涂层,薄膜厚度均匀性小于+/-3%。这项技术也正在开发用于处理圆形衬底,如硅晶圆。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Statistical optimization of high frequency LDMOS devices via hyper-fractionated experimental designs High temperature deformation of high density interconnects and packages by moire interferometry/FEM hybrid method Microsystems for medical applications The manufacturing logistics of cofire ceramic electronic packages Eutectic solder flip chip technology for chip scale package
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1