{"title":"A new 3-D MCM fabrication technology for high-speed chip-to-chip communication: vertically connected thin-film chip (VCTC) technology","authors":"S. Takahashi, T. Onodera, Y. Hayashi, T. Kunio","doi":"10.1109/VLSIT.1995.520894","DOIUrl":null,"url":null,"abstract":"A new 3-D MCM fabrication technology referred as \"Vertically Connected Thin-film Chip (VCTC)\" technology, has been developed. The VCTC process consists of chip thinning by CMP, the thinned-chip stacking by polyimide adhesive, and vertical interconnection formation by polyimide dry-etching and gold plating. From the SPICE simulation, short line length is a main factor to realize high-speed inter-chip communication with small delay, so the VCTC technology is effective on high-speed systems.","PeriodicalId":328379,"journal":{"name":"1995 Symposium on VLSI Technology. Digest of Technical Papers","volume":"64 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1995 Symposium on VLSI Technology. Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.1995.520894","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
A new 3-D MCM fabrication technology referred as "Vertically Connected Thin-film Chip (VCTC)" technology, has been developed. The VCTC process consists of chip thinning by CMP, the thinned-chip stacking by polyimide adhesive, and vertical interconnection formation by polyimide dry-etching and gold plating. From the SPICE simulation, short line length is a main factor to realize high-speed inter-chip communication with small delay, so the VCTC technology is effective on high-speed systems.