Device linearity enhancement of InGaP/InGaAs/GaAs camel-gate p-channel pseudomorphic high electron mobility transistor

J. Tsai, S. Chiu, Ying-Cheng Chu, King-Poul Zhu
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Abstract

A high-performance InGaP/InGaAs/GaAs p-channel pseudomorphic modulation-doped field effect transistor based on p/sup +/-GaAs/n/sup +/-InGaP/p-InGaP camel-like gate structure is demonstrated. Due to the p-n depletion of the camel-like gate and the presence of relatively large /spl Delta/Ev at InGaP/InGaAs heterostructure, an extremely large gate turn-on voltage than 2 V is measured. For a 1/spl times/100 /spl mu/m/sup 2/ device, the experimental results show a maximum saturation current density of -345 mA/mm and a widely broad gate voltage swing than 4 V with 80 % maximum transconductance. Furthermore, the f/sub T/ and f/sub max/ values are 3.1 and 4.8 GHz, respectively.
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InGaP/InGaAs/GaAs骆驼栅p沟道伪晶高电子迁移率晶体管器件线性度的增强
提出了一种基于p/sup +/-GaAs/n/sup +/-InGaP/p-InGaP骆驼状栅极结构的高性能InGaP/InGaAs/GaAs p沟道伪晶调制掺杂场效应晶体管。由于骆驼状栅极的p-n损耗以及InGaP/InGaAs异质结构中存在较大的δ /Ev,测量到的栅极导通电压大于2 V。对于1/spl倍/100 /spl mu/m/sup 2/器件,实验结果表明,最大饱和电流密度为-345 mA/mm,栅极电压摆幅大于4 V,最大跨导率为80%。f/sub T/和f/sub max/分别为3.1 GHz和4.8 GHz。
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