Punchthrough type GTO with buffer layer and homogeneous low efficiency anode structure

S. Eicher, F. Bauer, A. Weber, H. Zeller, W. Fichtner
{"title":"Punchthrough type GTO with buffer layer and homogeneous low efficiency anode structure","authors":"S. Eicher, F. Bauer, A. Weber, H. Zeller, W. Fichtner","doi":"10.1109/ISPSD.1996.509495","DOIUrl":null,"url":null,"abstract":"A new type of full scale 4.5 kV/3 kA GTO has been developed, fabricated, and electrically characterized. The device utilizes a punchthrough concept with a buffer layer. To avoid the requirement of excessive gate currents for turn-on, the new GTO has a homogeneous anode layer without shorts. The anode has a very low efficiency, which allows efficient extraction of charge during turn-off. With the buffer layer, the new device has a significantly reduced wafer thickness as compared to conventional devices without buffer. This reduces switching as well as on-state losses. The turn-off losses of the best devices were reduced to one third of those of conventional GTOs and, at the same time, the on-state losses were decreased by more than one third.","PeriodicalId":377997,"journal":{"name":"8th International Symposium on Power Semiconductor Devices and ICs. ISPSD '96. Proceedings","volume":"693 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"17","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"8th International Symposium on Power Semiconductor Devices and ICs. ISPSD '96. Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.1996.509495","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 17

Abstract

A new type of full scale 4.5 kV/3 kA GTO has been developed, fabricated, and electrically characterized. The device utilizes a punchthrough concept with a buffer layer. To avoid the requirement of excessive gate currents for turn-on, the new GTO has a homogeneous anode layer without shorts. The anode has a very low efficiency, which allows efficient extraction of charge during turn-off. With the buffer layer, the new device has a significantly reduced wafer thickness as compared to conventional devices without buffer. This reduces switching as well as on-state losses. The turn-off losses of the best devices were reduced to one third of those of conventional GTOs and, at the same time, the on-state losses were decreased by more than one third.
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具有缓冲层和均匀低效率阳极结构的穿孔式GTO
研制了一种新型全尺寸4.5 kV/ 3ka GTO,并对其进行了电学表征。该装置利用了带有缓冲层的穿孔概念。为了避免导通时栅电流过大的要求,新型GTO具有均匀的无短路阳极层。阳极有一个非常低的效率,这允许在关断期间有效地提取电荷。由于有缓冲层,与没有缓冲层的传统器件相比,新器件的晶圆厚度显著降低。这减少了开关和导通损耗。最佳器件的关断损耗降低到传统gto的三分之一,同时导通状态损耗降低了三分之一以上。
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