M. Charbonnier, J. Mitard, C. Leroux, G. Ghibaudo, V. Cosnier, P. Besson, F. Martin, G. Reimbold
{"title":"Reliable extraction of metal gate work function by combining two electrical characterization methods","authors":"M. Charbonnier, J. Mitard, C. Leroux, G. Ghibaudo, V. Cosnier, P. Besson, F. Martin, G. Reimbold","doi":"10.1109/ESSDERC.2007.4430931","DOIUrl":null,"url":null,"abstract":"In this paper, we extract the gate work function of metal/High-K stacks (WFM) with an internal photoemission (IPE) based method and a C(V) characterization method. We attempt to apply both of them on the same specially designed samples. We show that it leads to a better reliability of WFM and highlights new phenomena.","PeriodicalId":103959,"journal":{"name":"ESSDERC 2007 - 37th European Solid State Device Research Conference","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ESSDERC 2007 - 37th European Solid State Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDERC.2007.4430931","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
In this paper, we extract the gate work function of metal/High-K stacks (WFM) with an internal photoemission (IPE) based method and a C(V) characterization method. We attempt to apply both of them on the same specially designed samples. We show that it leads to a better reliability of WFM and highlights new phenomena.
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