Reliability investigations of different bumping processes for flip chip and TAB applications

E. Jung, J. Kloeser, J. Nave, G. Engelmann, L. Dietrich, E. Zakel, H. Reichl
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引用次数: 7

Abstract

Presently, a number of bump metallurgies are used for flip chip and TAB technology. However, no conclusive characterisation of the processes used and reliability obtained is available up to now. For wafer bumping, alloys of electroplated PbSn5, PbSn63, AuSn20 and metals like Au are used as well as electroless Ni(P)-Au deposition. Flexible bumping processes like Au stud bumping and mechanical bumping with PbSn solders on a solder wettable UBM are evaluated as alternatives, which are of essential importance for flip chip or TAB especially for small and medium volume applications. Reliability investigations on these used metallurgies are performed. The mechanical stability of the bumps is tested after thermal cycling, taking special care in the determination of the failure mode. Finally, the results are characterized, compared and evaluated.
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倒装芯片和标签应用中不同碰撞工艺的可靠性研究
目前,许多凹凸金属被用于倒装芯片和标签技术。然而,到目前为止,对所使用的工艺和获得的可靠性还没有结论性的描述。对于晶圆碰撞,采用电镀PbSn5, PbSn63, AuSn20合金和Au等金属,以及化学沉积Ni(P)-Au。柔性碰撞工艺,如金螺柱碰撞和PbSn焊料在可焊湿性UBM上的机械碰撞,被评估为替代方案,这对倒装芯片或标签至关重要,特别是对于中小批量应用。对这些已使用的冶金材料进行了可靠性调查。在热循环后测试凸起的机械稳定性,在确定失效模式时要特别注意。最后,对结果进行了表征、比较和评价。
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