Y. Shih, Chia-Fu Lee, Yen-An Chang, Po-Hao Lee, Hon-Jarn Lin, Yu-Lin Chen, Chieh-Pu Lo, Ku-Feng Lin, T. Chiang, Yuan-Jen Lee, K. Shen, Roger Wang, Wayne Wang, H. Chuang, Eric Wang, Y. Chih, Jonathan Chang
{"title":"A Reflow-capable, Embedded 8Mb STT-MRAM Macro with 9nS Read Access Time in 16nm FinFET Logic CMOS Process","authors":"Y. Shih, Chia-Fu Lee, Yen-An Chang, Po-Hao Lee, Hon-Jarn Lin, Yu-Lin Chen, Chieh-Pu Lo, Ku-Feng Lin, T. Chiang, Yuan-Jen Lee, K. Shen, Roger Wang, Wayne Wang, H. Chuang, Eric Wang, Y. Chih, Jonathan Chang","doi":"10.1109/IEDM13553.2020.9372115","DOIUrl":null,"url":null,"abstract":"In this paper, we present the design and silicon characterization results of an 8Mb STT-MRAM macro in 16nm FinFET Logic CMOS process. The STT-MRAM film stack is carefully designed to achieve both solder-reflow tolerance and short write pulse of 50nS. A merged reference scheme with reverse connected reference cells are proposed for read-disturb immunity. A read access time of 9nS is achieved from -40C to 125C and Vdd=0.8V±10%, making it suitable for high performance MCU applications. Silicon data measurement is presented to demonstrate a logic-process compatible, perpendicular STT-MRAM in 16nm FinFET CMOS process. The bit-error-rate has achieved zero fail-bit-count at 50-percentile for the 8Mb test-chip at wafer level.","PeriodicalId":415186,"journal":{"name":"2020 IEEE International Electron Devices Meeting (IEDM)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"24","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE International Electron Devices Meeting (IEDM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM13553.2020.9372115","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 24
Abstract
In this paper, we present the design and silicon characterization results of an 8Mb STT-MRAM macro in 16nm FinFET Logic CMOS process. The STT-MRAM film stack is carefully designed to achieve both solder-reflow tolerance and short write pulse of 50nS. A merged reference scheme with reverse connected reference cells are proposed for read-disturb immunity. A read access time of 9nS is achieved from -40C to 125C and Vdd=0.8V±10%, making it suitable for high performance MCU applications. Silicon data measurement is presented to demonstrate a logic-process compatible, perpendicular STT-MRAM in 16nm FinFET CMOS process. The bit-error-rate has achieved zero fail-bit-count at 50-percentile for the 8Mb test-chip at wafer level.