A. Quintero, P. Gergaud, J. Hartmann, V. Reboud, E. Cassan, P. Rodriguez
{"title":"Effects of alloying elements (Pt or Co) on nickel-based contact technology for GeSn layers","authors":"A. Quintero, P. Gergaud, J. Hartmann, V. Reboud, E. Cassan, P. Rodriguez","doi":"10.23919/IWJT.2019.8802618","DOIUrl":null,"url":null,"abstract":"We have investigated the impact Pt or Co alloying have on Ni-based metallization in order to efficiently contact GeSn layers. In-situ X-ray diffraction (XRD), atomic force microscopy (AFM) and Sheet resistance (Rsh) measurements were performed. Solid-state reactions, surface morphology and electrical properties were studied, as a function of temperature annealing. Special attention was paid to differences depending on the alloying element.","PeriodicalId":441279,"journal":{"name":"2019 19th International Workshop on Junction Technology (IWJT)","volume":"72 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 19th International Workshop on Junction Technology (IWJT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/IWJT.2019.8802618","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We have investigated the impact Pt or Co alloying have on Ni-based metallization in order to efficiently contact GeSn layers. In-situ X-ray diffraction (XRD), atomic force microscopy (AFM) and Sheet resistance (Rsh) measurements were performed. Solid-state reactions, surface morphology and electrical properties were studied, as a function of temperature annealing. Special attention was paid to differences depending on the alloying element.
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