Lithography

Mark Neisser, Harry J. Levinson, S. Wurm, D. Kyser, Takeo Watanabe, Kenneth P. MacWilliams, H. Ishiuchi, W. Trybula, Naoya Hayashi, Ted Fedynyshyn, Craig Higgins, Tsuyoshi Nakamura, Douglas J. Resnick, Moshe E. Preil, M. Lercel, Hajime Aoyama, E. Hosler
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Abstract

Historically, improvements in lithography have enabled improved chip technologies. The International Roadmap for Devices and Systems (IRDS) Lithography roadmap predicts where current patterning capability can support future chip generations and where challenges and improvements are needed. It is intended to be used by semiconductor industry participants, by industry analysts, and by researchers who want or need to know how the industry will evolve in the future and what challenges need to be addressed.
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光刻技术
从历史上看,光刻技术的改进使芯片技术得以改进。器件和系统国际路线图(IRDS)光刻路线图预测当前的模式能力可以支持未来的芯片一代,以及需要挑战和改进的地方。它旨在供半导体行业参与者、行业分析师以及想要或需要了解行业未来将如何发展以及需要解决哪些挑战的研究人员使用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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What is the IRDS? 2021 IRDS Teams' Acknowledgments Packaging Integration White Paper Outside System Connectivity Lithography
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