Design and Optimization of $\boldsymbol{\beta}$-Ga2O3 on (h-BN layered) Sapphire for High Efficiency Power Transistors: A Device-Circuit-Package Perspective

B. Mahajan, Yen-Pu Chen, W. Ahn, N. Zagni, M. Alam
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引用次数: 4

Abstract

Despite exceeding the Baliga's Figure of Merit (BFOM) by 400% and Huang's Chip Area Manufacturing FOM (HCAFOM) by 330% [1], the performance of existing $\beta$-Ga2O3 FETs is inferior to that of GaN, primarily due to extreme self-heating. Self-heating effect (SHE) has emerged as an important concern for device performance, output power density, run-time variability and reliability for modern logic transistors. The effects are even more severe for high-power transistor where the channel material may be a poor thermal conductor, e.g. $\beta$-Ga2O3. Very high internal electric fields, extreme temperature and mechanical stresses associated with these transistors drive electrochemical reactions [2], influence atomic processes [3], and accelerate multiple non-equilibrium effects [4]. A device-circuit-package, multi-physics, multi-scale simulation is needed to capture these effects self-consistently, but such a model has not yet been developed. In this paper, we (i) develop the first self-consistent device (TCAD), circuit (HSPICE), and package (COMSOL) model considering SHE which predicts FET performance on variety of substrates accurately; (ii) use the model to propose a novel hexagonal-Boron Nitride (h-BN) based $\beta$-Ga2O3 FET with 30% (cf. Sapphire substrate) and 80% (cf. SiO2 substrate) reduction in thermal resistance $(R_{th})$; (iii) demonstrate the performance of boost converter (with parameters extracted from our TCAD model) with h-BN based $\beta$-Ga2O3 FET, which outperforms the existing $\beta$-Ga2O3 FETs, achieving an efficiency within 10-15% of highest performing enhancement mode (E-mode) GaN FET; (iv) propose h-BN based FinFET which exceeds the ION of the existing $\beta$-Ga2O3 FET by more than 500%; and (v) develop a Faraday-cage type novel packaging strategy for effective heat dissipation and efficient system performance in $\beta$-Ga2O3 FETs.
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基于器件-电路-封装视角的(h-BN层状)蓝宝石上ga2o3的设计与优化
尽管超过Baliga's Figure of Merit (bom) 400%和Huang's Chip Area Manufacturing FOM (HCAFOM) 330%[1],现有的$\beta$-Ga2O3 fet的性能不如GaN,主要是由于极端的自热。自热效应(SHE)已成为现代逻辑晶体管器件性能、输出功率密度、运行时间可变性和可靠性的重要问题。对于高功率晶体管,这种影响甚至更为严重,其中通道材料可能是一个不良的热导体,例如$\beta$-Ga2O3。与这些晶体管相关的极高的内部电场、极端温度和机械应力驱动电化学反应[2],影响原子过程[3],并加速多种非平衡效应[4]。需要一个器件-电路-封装、多物理场、多尺度的模拟来自一致地捕获这些效应,但这样的模型尚未开发出来。在本文中,我们(i)开发了第一个考虑SHE的自一致器件(TCAD),电路(HSPICE)和封装(COMSOL)模型,该模型可以准确预测FET在各种衬底上的性能;(ii)利用该模型提出了一种新型的六方氮化硼(h-BN)基$\beta$-Ga2O3场效应管,其热阻$(R_{th})$降低30% (cf.蓝宝石衬底)和80% (cf. SiO2衬底);(iii)展示了基于h-BN的$\beta$-Ga2O3 FET的升压变换器的性能(参数从我们的TCAD模型中提取),其性能优于现有的$\beta$-Ga2O3 FET,其效率在最高性能增强模式(e模式)GaN FET的10-15%之内;(iv)提出基于h-BN的FinFET,其离子比现有的$\beta$-Ga2O3 FET高出500%以上;(v)开发法拉第笼型新型封装策略,用于$\beta$-Ga2O3 fet的有效散热和高效系统性能。
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