Y. Kawasaki, K. Tokunaga, K. Horita, K. Mitsuda, A. Yamaguchi, A. Ueno, A. Teratani, T. Katayama, K. Hayami, A. Togawa, Y. Ohno, M. Yoneda
{"title":"The collapse of gate electrode in high-current implanter of batch type","authors":"Y. Kawasaki, K. Tokunaga, K. Horita, K. Mitsuda, A. Yamaguchi, A. Ueno, A. Teratani, T. Katayama, K. Hayami, A. Togawa, Y. Ohno, M. Yoneda","doi":"10.1109/IWJT.2004.1306753","DOIUrl":null,"url":null,"abstract":"We looked for possible mechanical damage to the gate electrodes during implantation in high-current implanter of batch type and we found that there was damage in gate electrodes with a length of 60 nm to 85 nm, which is caused by collision with particles. It was confirmed that the damage is dependent on spin speed, gate direction and existence of photo resist.","PeriodicalId":342825,"journal":{"name":"The Fourth International Workshop on Junction Technology, 2004. IWJT '04.","volume":"81 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"The Fourth International Workshop on Junction Technology, 2004. IWJT '04.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IWJT.2004.1306753","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
Abstract
We looked for possible mechanical damage to the gate electrodes during implantation in high-current implanter of batch type and we found that there was damage in gate electrodes with a length of 60 nm to 85 nm, which is caused by collision with particles. It was confirmed that the damage is dependent on spin speed, gate direction and existence of photo resist.
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