VACNT fabrication on aluminum using “fast-heating” thermal CVD

Abstract

A fast-heating scheme is utilized for long VACTN-TIM fabrication directly on metal substrate. VACNT arrays with lengths of more than 100 μm were achieved on Al thin film by a conventional thermal CVD at a low temperature of 600 °C. Our methodology allows patterned VACNT array fabrication using a standard lift-off process for various applications, such as thermal interface materials, super capacitor field emission devices and electronic interconnects.