{"title":"Fabrication of sub-micrometer Si spheres with atomic-scale surface smoothness using homogenized KrF excimer laser reformation system","authors":"S. Hung, S. Shiu, C. Chao, Ching-Fuh Lin","doi":"10.1109/OMEMS.2008.4607860","DOIUrl":null,"url":null,"abstract":"In this paper, a novel technique using the homogenized KrF excimer laser reformation is presented as an alternative method for fabricating Si spheres.","PeriodicalId":402931,"journal":{"name":"2008 IEEE/LEOS International Conference on Optical MEMs and Nanophotonics","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-08-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE/LEOS International Conference on Optical MEMs and Nanophotonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMEMS.2008.4607860","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this paper, a novel technique using the homogenized KrF excimer laser reformation is presented as an alternative method for fabricating Si spheres.
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