Process characterization of highly conductive silver paste die attach materials for thin die on QFN

L. Wai, D. Zhi, V. S. Rao, Min Woo Daniel Rhee
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引用次数: 9

Abstract

In this paper, die attach process characterization on two type of highly conductive silver paste die attach materials was discussed. The first silver paste die attach materials (DA1) was used as a reference which is silver-loaded epoxy adhesive with high thermal conductivity of 60W/mK and electrical conductivity of 16Ms/m. Second silver paste die attach material (DA2) can be sintered with low pressure or pressure-less at temperature of 220°C to 280°C. DA2 material acquires high thermal conductivity range of 100–170W/mK and electrical conductivity range of 12–15Ms/m. Process specifications were set at die tilt < 1%, average bond line thickness between 25μm to 50μm and full die attach materials coverage without overflow of materials on top of die's surface. Process was optimized with 70μm thin silicon daisy chain chip with die size of 5mm×5mm on Ag plated QFN lead frame for both silver paste materials and achieved the required process specifications. Process optimized on DA1 achieved average bond line thickness ranged from 24.5μm to 30.5μm with die tilt less than 0.24% and DA2 had average bond line thickness ranged from 32.6μm to 44.2 μm with die tilt less than 0.15%. There was further evaluation on die attach process with silver sintered paste for different die thickness (which 50μm, 70μm and 175μm were used) on a fixed die size of 5mm×5mm. Porosity after die attach cure is always a curial factor which affects the modulus and conductivity of the device. Investigation on porosity of cured die attached materials was carrying out on different die size range from 0.5mm × 0.5mm to 5mm × 5mm. This helped to understand the effect of die size on sintering process. Optimization of dispensing pattern and die attach process challenges of thin die attachment were discussed in details in this paper.
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QFN薄模高导电性银浆贴片材料的工艺表征
本文讨论了两种高导电性银浆贴模材料的贴模工艺特性。以第一种银糊贴模材料DA1为参照,该材料为导热系数60W/mK、电导率16Ms/m的载银环氧胶粘剂。第二银膏体贴模材料(DA2)可以在220℃~ 280℃的温度下低压或无压烧结。DA2材料的导热系数可达100-170W /mK,电导率可达12-15Ms /m。工艺规范设定为模具倾斜< 1%,平均粘接线厚度在25μm至50μm之间,模具贴附材料完全覆盖,模具表面不溢出材料。在两种银浆材料的镀银QFN引线框架上,采用70μm薄硅菊花链芯片(芯片尺寸为5mm×5mm)对工艺进行优化,达到了工艺要求。在DA1上优化的工艺,平均键合线厚度在24.5 ~ 30.5μm之间,模倾角小于0.24%;在DA2上优化的工艺,平均键合线厚度在32.6 ~ 44.2 μm之间,模倾角小于0.15%。在固定模具尺寸5mm×5mm上,对不同模具厚度(分别为50μm、70μm和175μm)的银烧结膏贴模工艺进行了进一步评价。模接固化后的孔隙率一直是影响器件模量和电导率的一个弯曲因素。在0.5mm × 0.5mm ~ 5mm × 5mm不同的模具尺寸范围内,对固化模具附着材料的孔隙率进行了研究。这有助于了解模具尺寸对烧结过程的影响。详细讨论了薄模贴装的点胶模式优化和贴装工艺挑战。
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