Direct measurement of the soft-error immunity on the DRAM well structure by using the nuclear microprobe

Y. Ohno, T. Kishimoto, K. Sonoda, H. Sayama, S. Komori, A. Kinomura, Y. Horino, K. Fujii, T. Nishimura, M. Takai, H. Miyoshi
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Abstract

The soft-error evaluation method using the nuclear microprobe has been demonstrated. This method realized the quantitative study of the charge collection which induces the soft-error event. The retrograde well structure with the double buried p/sup +/ layers was found to be more effective for the soft-error immunity of DRAMs, as compared with the conventional well structure on the p/sup -/epi/p/sup +/ substrate. These results were well proved by the simulation results. The evaluation method using high-energy nuclear microprobe gives the principle to optimize the well structure for the soft-error immunity of advanced DRAMs.
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用核微探针直接测量DRAM井结构的软误差抗扰度
论证了核微探针的软误差评价方法。该方法实现了引起软误差事件的电荷收集的定量研究。与p/sup -/epi/p/sup +/基板上的常规井结构相比,双埋p/sup +/层的逆行井结构对dram的软误差免疫更有效。仿真结果很好地证明了这些结果。高能核微探针评价方法为先进dram的软误差抗扰性优化提供了理论依据。
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