Y. Ohno, T. Kishimoto, K. Sonoda, H. Sayama, S. Komori, A. Kinomura, Y. Horino, K. Fujii, T. Nishimura, M. Takai, H. Miyoshi
{"title":"Direct measurement of the soft-error immunity on the DRAM well structure by using the nuclear microprobe","authors":"Y. Ohno, T. Kishimoto, K. Sonoda, H. Sayama, S. Komori, A. Kinomura, Y. Horino, K. Fujii, T. Nishimura, M. Takai, H. Miyoshi","doi":"10.1109/VLSIT.1995.520899","DOIUrl":null,"url":null,"abstract":"The soft-error evaluation method using the nuclear microprobe has been demonstrated. This method realized the quantitative study of the charge collection which induces the soft-error event. The retrograde well structure with the double buried p/sup +/ layers was found to be more effective for the soft-error immunity of DRAMs, as compared with the conventional well structure on the p/sup -/epi/p/sup +/ substrate. These results were well proved by the simulation results. The evaluation method using high-energy nuclear microprobe gives the principle to optimize the well structure for the soft-error immunity of advanced DRAMs.","PeriodicalId":328379,"journal":{"name":"1995 Symposium on VLSI Technology. Digest of Technical Papers","volume":"39 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1995 Symposium on VLSI Technology. Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.1995.520899","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The soft-error evaluation method using the nuclear microprobe has been demonstrated. This method realized the quantitative study of the charge collection which induces the soft-error event. The retrograde well structure with the double buried p/sup +/ layers was found to be more effective for the soft-error immunity of DRAMs, as compared with the conventional well structure on the p/sup -/epi/p/sup +/ substrate. These results were well proved by the simulation results. The evaluation method using high-energy nuclear microprobe gives the principle to optimize the well structure for the soft-error immunity of advanced DRAMs.