High productivity thermal compression bonding for 3D-IC

N. Asahi, Y. Miyamoto, M. Nimura, Y. Mizutani, Y. Arai
{"title":"High productivity thermal compression bonding for 3D-IC","authors":"N. Asahi, Y. Miyamoto, M. Nimura, Y. Mizutani, Y. Arai","doi":"10.1109/3DIC.2015.7334577","DOIUrl":null,"url":null,"abstract":"The evaluation result of 4 layer stacked IC which was bonded using thermal compression bonder (TCB) is reported. The throughput can be remarkably improved because chips of multi-layer can be pre bonded by using non-conductive film (NCF) which is pre-applied adhesive and can be thermally pressed at a time. To realize this process, we stacked the 4 chips having through silicon via (TSV) on a Si substrate and evaluated the connectibility. As the evaluation after bonding, wettability of a solder by cross-section observation and a void in NCF layer by constant depth mode scanning acoustic microscope (C-SAM) observation were confirmed. As a result, it was confirmed that the voidless and good solder joints were possible by reducing the temperature difference in a stacking direction. For the evaluation, we used the TEG of 6 mm × 6 mm × 0.05 mm size which has more than 15,000 bumps of 12 μm height and 15 μm diameter. It was also demonstrated that gang bonding for a plurality of pre bonded chips formed on a substrate was possible by using the novel bonding attachment which accepts the thicknesses difference of 5 μm.","PeriodicalId":253726,"journal":{"name":"2015 International 3D Systems Integration Conference (3DIC)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"30","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 International 3D Systems Integration Conference (3DIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/3DIC.2015.7334577","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 30

Abstract

The evaluation result of 4 layer stacked IC which was bonded using thermal compression bonder (TCB) is reported. The throughput can be remarkably improved because chips of multi-layer can be pre bonded by using non-conductive film (NCF) which is pre-applied adhesive and can be thermally pressed at a time. To realize this process, we stacked the 4 chips having through silicon via (TSV) on a Si substrate and evaluated the connectibility. As the evaluation after bonding, wettability of a solder by cross-section observation and a void in NCF layer by constant depth mode scanning acoustic microscope (C-SAM) observation were confirmed. As a result, it was confirmed that the voidless and good solder joints were possible by reducing the temperature difference in a stacking direction. For the evaluation, we used the TEG of 6 mm × 6 mm × 0.05 mm size which has more than 15,000 bumps of 12 μm height and 15 μm diameter. It was also demonstrated that gang bonding for a plurality of pre bonded chips formed on a substrate was possible by using the novel bonding attachment which accepts the thicknesses difference of 5 μm.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
用于3D-IC的高生产率热压缩键合
报道了采用热压缩粘结剂(TCB)粘结的4层堆叠集成电路的评价结果。采用预涂胶、一次性热压的非导电膜(NCF)对多层芯片进行预粘接,可显著提高芯片的吞吐量。为了实现这一过程,我们将4个具有通硅孔(TSV)的芯片堆叠在硅衬底上,并评估了可连接性。作为焊后的评价,通过截面观察证实了焊料的润湿性,通过恒深模式扫描声显微镜(C-SAM)观察证实了NCF层中存在空洞。结果表明,通过减小堆焊方向上的温差,可以得到无空洞、良好的焊点。为了进行评价,我们使用了尺寸为6 mm × 6 mm × 0.05 mm的TEG,该TEG具有超过15,000个高度为12 μm,直径为15 μm的凸起。实验还表明,采用该新型键合附件,可以实现在衬底上形成的多个预键合芯片的键合,其厚度差为5 μm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
No pumping at 450°C with electrodeposited copper TSV Comprehensive comparison of 3D-TSV integrated solid-state drives (SSDs) with storage class memory and NAND flash memory Vacuum-assisted-spin-coating of polyimide liner for high-aspect-ratio TSVs applications Reconfigured multichip-on-wafer (mCoW) Cu/oxide hybrid bonding technology for ultra-high density 3D integration using recessed oxide, thin glue adhesive, and thin metal capping layers Neuromorphic semiconductor memory
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1