Kai-Chi Chen, H. Li, Che-Hao Shih, Wen-Bin Chen, Shu-Chen Huang
{"title":"A new thermosetting resin prepared from a siloxane-containing benzoxazine and epoxy resin","authors":"Kai-Chi Chen, H. Li, Che-Hao Shih, Wen-Bin Chen, Shu-Chen Huang","doi":"10.1109/ESTC.2014.6962803","DOIUrl":null,"url":null,"abstract":"Copolymerization of PBZ precursors with epoxies forms network structures with high crosslinking densities, potentially improving the thermal and mechanical properties. In this study, we copolymerized the siloxane-imide-containing benzoxazine BZ-A6 was with siloxane-epoxy GT-1000. Analyses using differential scanning calorimetry and Fourier transform infrared spectroscopy revealed that the copolymers were formed at a relatively low curing temperature of 150 °C. The siloxane benzoxazine/epoxy mixture exhibited high thermal stability, with a high char yield of 44.6% and a high decomposition temperature of 364.9 °C. Moreover, during UV exposure tests, the water contact angle of the BZ-A6/GT-1000 copolymer was more stable than that of the conventional bisphenol A-type benzoxazine-epoxy Ba/DGEBA, suggesting that our new benzoxazine/epoxy mixture would be more suitable for applications requiring hydrophobic materials that are UV resistant. The low curing temperature and good temperature- and UV-resistance of this siloxane benzoxazine/epoxy mixture should make it widely applicable, such as IC package materials (film type encapsulant, paste encapsulant) or weather resistance application.","PeriodicalId":299981,"journal":{"name":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","volume":"81 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESTC.2014.6962803","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Copolymerization of PBZ precursors with epoxies forms network structures with high crosslinking densities, potentially improving the thermal and mechanical properties. In this study, we copolymerized the siloxane-imide-containing benzoxazine BZ-A6 was with siloxane-epoxy GT-1000. Analyses using differential scanning calorimetry and Fourier transform infrared spectroscopy revealed that the copolymers were formed at a relatively low curing temperature of 150 °C. The siloxane benzoxazine/epoxy mixture exhibited high thermal stability, with a high char yield of 44.6% and a high decomposition temperature of 364.9 °C. Moreover, during UV exposure tests, the water contact angle of the BZ-A6/GT-1000 copolymer was more stable than that of the conventional bisphenol A-type benzoxazine-epoxy Ba/DGEBA, suggesting that our new benzoxazine/epoxy mixture would be more suitable for applications requiring hydrophobic materials that are UV resistant. The low curing temperature and good temperature- and UV-resistance of this siloxane benzoxazine/epoxy mixture should make it widely applicable, such as IC package materials (film type encapsulant, paste encapsulant) or weather resistance application.