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Impact of deflashing process and Sn plating parameters towards temperature cycle on board (TCoB) reliability 闪蒸工艺和镀锡参数对板上温度循环可靠性的影响
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962810
J. Krishnan, H. Sax
In semiconductor devices, the common Temperature Cyle on Board Failure (TCoB) are open contacts due solder joint cracks after 2000 to 4000 temperature cycles on board - as shown in figure 1 depending on individual ECU configuration and applied temperature swing. Recently, we also encounter TCoB reliability failure, but this solder joint cracks happen along lead rather than through the solder. For this case the failure already appeared after 850 cycles, while other components on the exactly same board do not show a sign of degradation as can be seen at figure 2 and 3. This paper objective is to describes the critical factors that impact the Temperature Cycles on Board (TCoB) performance of a solder joint. The TCoB performance of lead free solder joints does not only depend on the solder paste and package Bill Of Material (BOM) used. Quality of final Sn finish as well as lead frame pre treatment and lead frame surface properties can also impact the TCoB performance of a lead free solder joint heavily. The service life of a lead free solder joint using bare Cu lead frame together with final Sn plating can significantly be improved considering the below findings: a) Carbon in the Sn plated layer from high additive concentrations or from Carbon contaminated electrolytes have to be avoided. b) Use Plating Current density lower than 20 ASD as parasitic carbon deposition is enhanced if a too high plating current density is used (>20ASD). c) Avoid using Media Deflashing Process because the leadframe surface will be damage thus prevents good Cu diffusion from base material. Cu/Sn inter diffusion has to be promoted to form a regular low stress intermetallic where the ratio of Cu6Sn5/Cu3Sn is approximately 1. d) Removing the damage top 1-2μm Cu base material cause by Cu sheet rolling from the lead frame processing using appropriate Cu descaling process or plating an additional thick Cu flash layer (>2μm) ensures good regular low stress intermetallic.
在半导体器件中,常见的板上温度循环故障(TCoB)是在2000到4000个板上温度循环后由于焊点裂纹而导致的触点开,如图1所示,具体取决于单个ECU配置和应用温度波动。最近,我们也遇到了TCoB可靠性失效,但这种焊点裂纹是沿着引线而不是通过焊料发生的。在这种情况下,故障已经在850个循环后出现,而完全相同板上的其他组件没有显示出如图2和3所示的退化迹象。本文的目的是描述影响焊点板上温度循环(TCoB)性能的关键因素。无铅焊点的TCoB性能不仅取决于所使用的焊膏和封装材料清单(BOM)。最终锡表面处理质量以及引线框架预处理和引线框架表面性能也会严重影响无铅焊点的TCoB性能。考虑到以下发现,使用裸铜引线框架和最终镀锡的无铅焊点的使用寿命可以显着提高:a)必须避免来自高浓度添加剂或碳污染电解质的镀锡层中的碳。b)使用低于20ASD的电镀电流密度,因为如果使用过高的电镀电流密度(>20ASD),则会增强寄生碳沉积。c)避免使用介质闪蒸工艺,因为引线框表面会被损坏,从而阻止铜从基材中扩散。Cu6Sn5/Cu3Sn的比值约为1,促进Cu/Sn间的扩散形成规则的低应力金属间。d)采用适当的Cu除垢工艺或额外镀厚Cu闪蒸层(>2μm)去除引线框架加工中Cu片轧制造成的顶部1-2μm Cu基材损伤,确保良好的规则低应力金属间化合物。
{"title":"Impact of deflashing process and Sn plating parameters towards temperature cycle on board (TCoB) reliability","authors":"J. Krishnan, H. Sax","doi":"10.1109/ESTC.2014.6962810","DOIUrl":"https://doi.org/10.1109/ESTC.2014.6962810","url":null,"abstract":"In semiconductor devices, the common Temperature Cyle on Board Failure (TCoB) are open contacts due solder joint cracks after 2000 to 4000 temperature cycles on board - as shown in figure 1 depending on individual ECU configuration and applied temperature swing. Recently, we also encounter TCoB reliability failure, but this solder joint cracks happen along lead rather than through the solder. For this case the failure already appeared after 850 cycles, while other components on the exactly same board do not show a sign of degradation as can be seen at figure 2 and 3. This paper objective is to describes the critical factors that impact the Temperature Cycles on Board (TCoB) performance of a solder joint. The TCoB performance of lead free solder joints does not only depend on the solder paste and package Bill Of Material (BOM) used. Quality of final Sn finish as well as lead frame pre treatment and lead frame surface properties can also impact the TCoB performance of a lead free solder joint heavily. The service life of a lead free solder joint using bare Cu lead frame together with final Sn plating can significantly be improved considering the below findings: a) Carbon in the Sn plated layer from high additive concentrations or from Carbon contaminated electrolytes have to be avoided. b) Use Plating Current density lower than 20 ASD as parasitic carbon deposition is enhanced if a too high plating current density is used (>20ASD). c) Avoid using Media Deflashing Process because the leadframe surface will be damage thus prevents good Cu diffusion from base material. Cu/Sn inter diffusion has to be promoted to form a regular low stress intermetallic where the ratio of Cu6Sn5/Cu3Sn is approximately 1. d) Removing the damage top 1-2μm Cu base material cause by Cu sheet rolling from the lead frame processing using appropriate Cu descaling process or plating an additional thick Cu flash layer (>2μm) ensures good regular low stress intermetallic.","PeriodicalId":299981,"journal":{"name":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123036615","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Flip-chip bonding processes with low volume SoP technology 采用小体积SoP技术的倒装芯片键合工艺
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962857
Y. Eom, Haksun Lee, Hyun-Cheol Bae, Kwang-Seong Choi, Jin-ho Lee
In order to build solder bumps with a fine-pitch of 100 μm and 130 μm on PCB substrate, low volume solder on pad (LVSoP) technology using a maskless technology was developed for SAC305 solder with a high melting temperature of 220°C. For the LVSoP process, SBM (solder bump maker) material was newly developed. The solder bump maker (SBM) paste and its process were quantitatively optimized to get a uniform height of solder bumps which are almost equal to the height of solder resist. Differential scanning calorimetry (DSC), viscosity measurement and physical flowing of SBM paste were precisely investigated and analyzed during LVSoP processing for an understanding of chemo-rheological phenomena of SBM paste. The average height of solder bumps and their maximum and minimum values were 14.7, 18.3 and 12.0 μm, respectively. It is believed that maskless LVSoP technology can be effectively used for a fine-pitch interconnection of a Cu pillar in the semiconductor packaging field. Flipchip bonding process between PCB substrate with low volume solder bumps and silicon device having the cupper pillars without solder caps was performed. As one of the key solution for fine pitch interconnection with Cu pillar for Flipchip bonding process, it is expected that LVSoP technology can be effectively used in semiconductor packaging.
为了在PCB基板上构建细间距为100 μm和130 μm的焊点,采用无掩模技术开发了低体积焊盘(LVSoP)技术,用于220°C的SAC305焊料。对于LVSoP工艺,新开发了SBM(焊料凹凸剂)材料。定量优化了凹凸锡膏及其工艺,使凹凸锡膏高度均匀,且几乎等于阻焊高度。通过差示扫描量热法(DSC)、粘度测量法和物理流动法对LVSoP加工过程中的SBM膏体进行了精确的研究和分析,以了解SBM膏体的化学流变现象。钎料凸点的平均高度为14.7 μm,最大值为18.3 μm,最小值为12.0 μm。无掩模LVSoP技术可以有效地用于半导体封装领域铜柱的细间距互连。研究了具有小体积焊点凸点的PCB基板与无焊点凸点的铜柱硅器件之间的倒装键合工艺。作为Flipchip键合工艺中铜柱细间距互连的关键解决方案之一,LVSoP技术有望在半导体封装中得到有效应用。
{"title":"Flip-chip bonding processes with low volume SoP technology","authors":"Y. Eom, Haksun Lee, Hyun-Cheol Bae, Kwang-Seong Choi, Jin-ho Lee","doi":"10.1109/ESTC.2014.6962857","DOIUrl":"https://doi.org/10.1109/ESTC.2014.6962857","url":null,"abstract":"In order to build solder bumps with a fine-pitch of 100 μm and 130 μm on PCB substrate, low volume solder on pad (LVSoP) technology using a maskless technology was developed for SAC305 solder with a high melting temperature of 220°C. For the LVSoP process, SBM (solder bump maker) material was newly developed. The solder bump maker (SBM) paste and its process were quantitatively optimized to get a uniform height of solder bumps which are almost equal to the height of solder resist. Differential scanning calorimetry (DSC), viscosity measurement and physical flowing of SBM paste were precisely investigated and analyzed during LVSoP processing for an understanding of chemo-rheological phenomena of SBM paste. The average height of solder bumps and their maximum and minimum values were 14.7, 18.3 and 12.0 μm, respectively. It is believed that maskless LVSoP technology can be effectively used for a fine-pitch interconnection of a Cu pillar in the semiconductor packaging field. Flipchip bonding process between PCB substrate with low volume solder bumps and silicon device having the cupper pillars without solder caps was performed. As one of the key solution for fine pitch interconnection with Cu pillar for Flipchip bonding process, it is expected that LVSoP technology can be effectively used in semiconductor packaging.","PeriodicalId":299981,"journal":{"name":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114301039","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Immobilization of metal coated polymer spheres on Indium pads 金属包覆聚合物球在铟衬垫上的固定化
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962800
Vinh Cao Duy, Hoang-Vu Nguyen, H. Kristiansen, M. Taklo, K. Aasmundtveit, N. Hoivik
This paper investigates an approach for creating a metallurgic bond between Ø5 μm metal (Au)-coated polymer spheres (MPS) and Indium (In) pads. MPS were positioned onto In pads where the metal coating reacted with the In. The MPS were deposited by dry dispensing. The adhesion force between the MPS and the In pads was measured by acceleration/centrifugal testing. Under a centrifugal force of 34 nN, the percentage of remaining MPS increased from 10 % for samples without heat treatment to more than 90 % for samples exposed to 200 °C annealing. This is a strong indication that a metallurgic bond had formed between the metal coating on the MPS and the In on the pads.
本文研究了在Ø5 μm金属(Au)包覆聚合物球(MPS)和铟(In)衬垫之间建立冶金键合的方法。MPS被放置在金属涂层与In发生反应的In衬垫上。采用干点胶法沉积MPS。通过加速/离心试验测量MPS与In衬垫之间的附着力。在34 nN的离心力下,剩余MPS的百分比从未热处理样品的10%增加到200℃退火样品的90%以上。这是一个强有力的迹象,表明在MPS上的金属涂层和衬垫上的In之间形成了冶金粘合。
{"title":"Immobilization of metal coated polymer spheres on Indium pads","authors":"Vinh Cao Duy, Hoang-Vu Nguyen, H. Kristiansen, M. Taklo, K. Aasmundtveit, N. Hoivik","doi":"10.1109/ESTC.2014.6962800","DOIUrl":"https://doi.org/10.1109/ESTC.2014.6962800","url":null,"abstract":"This paper investigates an approach for creating a metallurgic bond between Ø5 μm metal (Au)-coated polymer spheres (MPS) and Indium (In) pads. MPS were positioned onto In pads where the metal coating reacted with the In. The MPS were deposited by dry dispensing. The adhesion force between the MPS and the In pads was measured by acceleration/centrifugal testing. Under a centrifugal force of 34 nN, the percentage of remaining MPS increased from 10 % for samples without heat treatment to more than 90 % for samples exposed to 200 °C annealing. This is a strong indication that a metallurgic bond had formed between the metal coating on the MPS and the In on the pads.","PeriodicalId":299981,"journal":{"name":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124612720","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Challenges for thermal management and production technologies in concentrating photovoltaic (CPV) modules 聚光光伏(CPV)模块热管理和生产技术的挑战
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962842
M. Wiesenfarth, Sebastian Gamisch, Tobias Dorsam, A. Bett
In concentrating photovoltaics (CPV) solar radiation is concentrated up to 1000 times using inexpensive optics. This leads to high heat flux in the system of up to 100 W/cm2 and requires an efficient thermal design. There are actively and passively cooled systems. The thermal design of those systems is investigated with theoretical simulations. In this paper we present how to validate the simulations using indoor experiments. To manufacture CPV modules industrially, standard processes from the electronic industry like wire bonding or pick-and-place are used and adapted wherever possible. In this paper a process to mount solar cells with areas >1 cm2 using vacuum soldering is presented. For the integration of bypass diodes, the assembly adjacent or the use of special solar cell architectures like the MIMs are proposed.
在聚光光伏(CPV)中,使用廉价的光学元件将太阳辐射集中到1000倍。这导致系统的高热流密度高达100 W/cm2,需要高效的热设计。有主动和被动冷却系统。对这些系统的热设计进行了理论模拟研究。在本文中,我们提出了如何用室内实验来验证模拟。为了工业化生产CPV模块,我们尽可能使用和调整电子行业的标准工艺,如线键合或拾取和放置。本文介绍了一种利用真空焊接技术组装面积为bbb10 ~ 1cm2太阳能电池的方法。对于旁路二极管的集成,建议相邻组装或使用特殊的太阳能电池架构,如MIMs。
{"title":"Challenges for thermal management and production technologies in concentrating photovoltaic (CPV) modules","authors":"M. Wiesenfarth, Sebastian Gamisch, Tobias Dorsam, A. Bett","doi":"10.1109/ESTC.2014.6962842","DOIUrl":"https://doi.org/10.1109/ESTC.2014.6962842","url":null,"abstract":"In concentrating photovoltaics (CPV) solar radiation is concentrated up to 1000 times using inexpensive optics. This leads to high heat flux in the system of up to 100 W/cm2 and requires an efficient thermal design. There are actively and passively cooled systems. The thermal design of those systems is investigated with theoretical simulations. In this paper we present how to validate the simulations using indoor experiments. To manufacture CPV modules industrially, standard processes from the electronic industry like wire bonding or pick-and-place are used and adapted wherever possible. In this paper a process to mount solar cells with areas >1 cm2 using vacuum soldering is presented. For the integration of bypass diodes, the assembly adjacent or the use of special solar cell architectures like the MIMs are proposed.","PeriodicalId":299981,"journal":{"name":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129476829","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Thermal power plane enabling dual-side electrical interconnects for high-performance chip stacks: Concept 热功率平面为高性能芯片堆栈提供双面电互连:概念
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962727
T. Brunschwiler, R. Heller, G. Schlottig, T. Tick, H. Harrer, H. Barowski, Tim Niggemeier, J. Supper, S. Oggioni
In this paper, a novel concept of dual-side electrical interconnects (EIC) to a chip stack is discussed. In this concept, a second laminate, called Thermal Power Plane (TPP), is attached through solder rails to the top chip of the stack. The TPP provides efficient heat removal and current feed in the out-of-plane and the in-plane direction, respectively. Accordingly, the number of electrical interconnects to the chip stack can be doubled, enabling higher off-stack communication. An interconnect count analysis was performed for a two-die stack with cores in the top and cache in the bottom chip. The power to the top and the bottom chip is provided from the TPP and the bottom laminate, respectively. In this case, all power through-silicon vias (TSVs) can be eliminated, which would otherwise cover 3.3% of the bottom chip area. In addition, the design of the TSVs can be optimized for signaling only. The use of two laminates also enables individual test & burn-in of the dies prior to stack formation, potentially improving the yield by joining only known good dies. The feasibility of the concept is supported by thermal and electrical finite-element analysis. An 8-layer coreless laminate with stacked build-up vias, extending between both sides of the substrate, was considered as implementation of the TPP. The thermal performance of the dual-side EIC topology outperforms that of the classical single-side EIC approach by 5 Kmm2/W, when considering bar-shaped copper planes in the TPP and elongated top interconnects, called rails. A voltage uniformity to the top chip of better than 2% of the supply voltage can be provided for all TPP designs.
本文讨论了芯片堆叠的双侧电互连(EIC)新概念。在这个概念中,第二个层压板,称为热电源平面(TPP),通过焊轨连接到堆栈的顶部芯片。TPP分别在面外和面内方向提供有效的散热和电流馈送。因此,到芯片堆栈的电气互连数量可以增加一倍,从而实现更高的堆栈外通信。对上置核心、下置高速缓存的双晶片堆叠进行了互连计数分析。顶部和底部芯片的电源分别由TPP和底部层压板提供。在这种情况下,可以消除所有通过硅通孔(tsv)的功率,否则它们将覆盖芯片底部面积的3.3%。此外,tsv的设计可以仅针对信令进行优化。使用两个层压板还可以在叠层形成之前对模具进行单独的测试和烧蚀,通过只连接已知的好模具来潜在地提高产量。热电有限元分析支持了该概念的可行性。8层无芯层压板,在基板的两侧延伸堆叠过孔,被认为是TPP的实施。当考虑到TPP中的条形铜面和细长的顶部互连(称为轨)时,双面EIC拓扑的热性能优于经典的单面EIC方法5 Kmm2/W。对于所有的TPP设计,顶部芯片的电压均匀性优于电源电压的2%。
{"title":"Thermal power plane enabling dual-side electrical interconnects for high-performance chip stacks: Concept","authors":"T. Brunschwiler, R. Heller, G. Schlottig, T. Tick, H. Harrer, H. Barowski, Tim Niggemeier, J. Supper, S. Oggioni","doi":"10.1109/ESTC.2014.6962727","DOIUrl":"https://doi.org/10.1109/ESTC.2014.6962727","url":null,"abstract":"In this paper, a novel concept of dual-side electrical interconnects (EIC) to a chip stack is discussed. In this concept, a second laminate, called Thermal Power Plane (TPP), is attached through solder rails to the top chip of the stack. The TPP provides efficient heat removal and current feed in the out-of-plane and the in-plane direction, respectively. Accordingly, the number of electrical interconnects to the chip stack can be doubled, enabling higher off-stack communication. An interconnect count analysis was performed for a two-die stack with cores in the top and cache in the bottom chip. The power to the top and the bottom chip is provided from the TPP and the bottom laminate, respectively. In this case, all power through-silicon vias (TSVs) can be eliminated, which would otherwise cover 3.3% of the bottom chip area. In addition, the design of the TSVs can be optimized for signaling only. The use of two laminates also enables individual test & burn-in of the dies prior to stack formation, potentially improving the yield by joining only known good dies. The feasibility of the concept is supported by thermal and electrical finite-element analysis. An 8-layer coreless laminate with stacked build-up vias, extending between both sides of the substrate, was considered as implementation of the TPP. The thermal performance of the dual-side EIC topology outperforms that of the classical single-side EIC approach by 5 Kmm2/W, when considering bar-shaped copper planes in the TPP and elongated top interconnects, called rails. A voltage uniformity to the top chip of better than 2% of the supply voltage can be provided for all TPP designs.","PeriodicalId":299981,"journal":{"name":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124005080","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
Smart textile-based protective system for firefighters 基于智能纺织品的消防防护系统
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962821
R. Soukup, T. Blecha, A. Hamácek, J. Řeboun
This paper presents a research focused on a smart textile-based protective system which is intended to bring more safety to firefighters facing hazardous conditions. The system is fully integrated into a firefighter protective suit and it is able to monitor heart rate (HR), to detect movements of a firefighter, to detect toxic and combustible gases in the environment and to measure temperature (T) and relative humidity (RH) inside and outside of the suit. The protective system consists of developed integrated sensor modules, e-textile wiring harnesses, body control unit (BCU), central processing unit (CPU), body area network (BAN) and wide area network (WAN). The measured data are wirelessly transmitted over a wide area network with automatic routing algorithm to the central processing unit, which is checked by a firefighter operation chief, who is kept informed about an actual state of individual fire fighters. In case that some monitored parameter oversteps pre-set threshold values the BCU will automatically inform a fire fighter by means of acoustic alarm about oncoming risk.
本文研究了一种基于智能纺织品的防护系统,旨在为面临危险条件的消防员带来更多的安全。该系统完全集成到消防员防护服中,能够监测心率(HR),检测消防员的运动,检测环境中的有毒和可燃气体,并测量防护服内外的温度(T)和相对湿度(RH)。该保护系统由开发的集成传感器模块、电子纺织线束、车身控制单元(BCU)、中央处理单元(CPU)、车身局域网(BAN)和广域网(WAN)组成。测量到的数据通过带有自动路由算法的广域网无线传输到中央处理单元,中央处理单元由消防员操作主管检查,并随时了解每个消防员的实际状态。如果某些监控参数超过预设的阈值,BCU将自动通过声音报警的方式通知消防员即将到来的危险。
{"title":"Smart textile-based protective system for firefighters","authors":"R. Soukup, T. Blecha, A. Hamácek, J. Řeboun","doi":"10.1109/ESTC.2014.6962821","DOIUrl":"https://doi.org/10.1109/ESTC.2014.6962821","url":null,"abstract":"This paper presents a research focused on a smart textile-based protective system which is intended to bring more safety to firefighters facing hazardous conditions. The system is fully integrated into a firefighter protective suit and it is able to monitor heart rate (HR), to detect movements of a firefighter, to detect toxic and combustible gases in the environment and to measure temperature (T) and relative humidity (RH) inside and outside of the suit. The protective system consists of developed integrated sensor modules, e-textile wiring harnesses, body control unit (BCU), central processing unit (CPU), body area network (BAN) and wide area network (WAN). The measured data are wirelessly transmitted over a wide area network with automatic routing algorithm to the central processing unit, which is checked by a firefighter operation chief, who is kept informed about an actual state of individual fire fighters. In case that some monitored parameter oversteps pre-set threshold values the BCU will automatically inform a fire fighter by means of acoustic alarm about oncoming risk.","PeriodicalId":299981,"journal":{"name":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116305900","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 17
Reliability analysis of electronic assemblies using electrically conductive adhesive for high-reliability and Harsh environment applications 用于高可靠性和恶劣环境应用的导电胶粘剂电子组件可靠性分析
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962846
Aurelien Lecavelier des Etangs-Levallois, A. Grivon, D. Baudet, W. Maia, M. Brizoux
An alternative to lead-free soldering may be Electrically Conductive Adhesives (ECA) that feature lower soldering temperature. However, long-term electrical properties stability and reliability in harsh environment shall be studied. The work presented here is a comprehensive study of ECA second level interconnects characterization under thermal and thermo-mechanical stress for different PCB and component finishing.
无铅焊接的另一种选择可能是具有较低焊接温度的导电粘合剂(ECA)。但是,在恶劣环境下的长期电性能稳定性和可靠性需要研究。本文介绍的工作是对不同PCB和元件加工在热应力和热机械应力下的ECA二级互连特性的全面研究。
{"title":"Reliability analysis of electronic assemblies using electrically conductive adhesive for high-reliability and Harsh environment applications","authors":"Aurelien Lecavelier des Etangs-Levallois, A. Grivon, D. Baudet, W. Maia, M. Brizoux","doi":"10.1109/ESTC.2014.6962846","DOIUrl":"https://doi.org/10.1109/ESTC.2014.6962846","url":null,"abstract":"An alternative to lead-free soldering may be Electrically Conductive Adhesives (ECA) that feature lower soldering temperature. However, long-term electrical properties stability and reliability in harsh environment shall be studied. The work presented here is a comprehensive study of ECA second level interconnects characterization under thermal and thermo-mechanical stress for different PCB and component finishing.","PeriodicalId":299981,"journal":{"name":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","volume":"32 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126343292","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Inkjet filling of TSVs with silver nanoparticle ink 纳米银颗粒墨水在tsv中的喷墨填充
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962741
B. Khorramdel, M. Mantysalo
Through silicon vias (TSVs) have been used in 3D packaging of microelectronic devices and MEMS devices, where they provide electrical interconnections through the stacked wafers and devices. Currently, chemical vapor deposition (CVD) or electroless deposition are used to partially or fulfill the vias. However, these methods are time consuming. Thus, the potential of inkjet printing to linearly fill the TSVs with silver nanoparticle ink, as an additive digital fabrication technique, will be reviewed. This technique could make the via metallization process much faster, agile, and cost-efficient. In this study, vias with the outer diameter of 80μm and depth of around 115μm fabricated with dry-reactive ion etching (DRIE) are filled with a silver nano-particle ink NPS-J from Harima Chemicals using Dimatix inkjet printer (DMP-2800) with 10pl cartridge. Substrate temperature was found to be potentially more affective to print more droplets rather than increasing waiting time. Moreover, printing on the 60 °C substrate with no delay was optimum considering the uniformity, thickness and quality of the coverage.
通过硅通孔(tsv)已用于微电子器件和MEMS器件的3D封装,其中它们通过堆叠的晶圆和器件提供电气互连。目前,化学气相沉积(CVD)或化学沉积(CVD)被用于部分或完成过孔。然而,这些方法都很耗时。因此,作为一种增材数字制造技术,喷墨印刷将银纳米颗粒油墨线性填充tsv的潜力将被回顾。这种技术可以使金属化过程更快、更灵活、更经济。在本研究中,使用Dimatix喷墨打印机(DMP-2800)和10pl墨盒,采用干反应离子蚀刻(dry reactive ion etching, DRIE)技术制备了外径80μm、深度约115μm的Harima Chemicals纳米银粒子油墨NPS-J。发现衬底温度可能对打印更多液滴更有影响,而不是增加等待时间。此外,考虑到覆盖的均匀性、厚度和质量,在60°C的基材上无延迟印刷是最佳的。
{"title":"Inkjet filling of TSVs with silver nanoparticle ink","authors":"B. Khorramdel, M. Mantysalo","doi":"10.1109/ESTC.2014.6962741","DOIUrl":"https://doi.org/10.1109/ESTC.2014.6962741","url":null,"abstract":"Through silicon vias (TSVs) have been used in 3D packaging of microelectronic devices and MEMS devices, where they provide electrical interconnections through the stacked wafers and devices. Currently, chemical vapor deposition (CVD) or electroless deposition are used to partially or fulfill the vias. However, these methods are time consuming. Thus, the potential of inkjet printing to linearly fill the TSVs with silver nanoparticle ink, as an additive digital fabrication technique, will be reviewed. This technique could make the via metallization process much faster, agile, and cost-efficient. In this study, vias with the outer diameter of 80μm and depth of around 115μm fabricated with dry-reactive ion etching (DRIE) are filled with a silver nano-particle ink NPS-J from Harima Chemicals using Dimatix inkjet printer (DMP-2800) with 10pl cartridge. Substrate temperature was found to be potentially more affective to print more droplets rather than increasing waiting time. Moreover, printing on the 60 °C substrate with no delay was optimum considering the uniformity, thickness and quality of the coverage.","PeriodicalId":299981,"journal":{"name":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","volume":"3 6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130286849","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 16
Copper thick-film substrates for power electronic applications 电力电子用铜厚膜衬底
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962860
T. Blank, B. Leyrer, T. Maurer, M. Meisser, M. Bruns, M. Weber
Substrates for high power electronic systems are dominated by DCB-technology. Recently, new copper thick-film pastes have been proposed for use as high power substrates. They are compatible with Al2O3- and pre-oxised AlN-substrates. This paper investigates production processes to build up highly reliable power modules and explores basis electrical and thermal properties of thick-film copper substrates. Fired copper film thicknesses of 300 μm have been produced by subsequent print-dry-fire cycles. Smooth surfaces and copper films with a density of about 70 % of bulk copper have been produced. A power module comprising of 650 V IGBTs, diodes and an intelligent hall sensor with copper traces and spaces of 200 μm is presented. Wire bonding processes on copper thick-films with 500 μm aluminium wire and 400 μm copper wire are discussed. Test units with a 1200 V IGBT were built up. The IGBT was attached at 250 °C and a pressure of 15 MPa using a novel silver sinter paste. This paste can be directly used on copper. The current-carrying capacity of the thick-film test samples was found to be reduced by 10% in comparison to the DCB test device. No significant difference was found in the performance of both technologies in active power pulse tests lasting a few seconds. The number of cycles for test devices with sintered chips, bonded with 400 μm copper wire bonds exceeded 450,000 cycles in a cycles from 25 °C up to 150 °C.
大功率电子系统的基板以dcb技术为主。最近,新的铜厚膜浆料被提出用于大功率衬底。它们与Al2O3-和预氧化aln -衬底相容。本文研究了高可靠性电源模块的生产工艺,并探讨了厚膜铜基板的基本电学和热学性能。通过后续的打印-干-火循环制备了厚度为300 μm的烧制铜膜。已生产出光滑的表面和密度约为散装铜70%的铜膜。提出了一种由650v igbt、二极管和智能霍尔传感器组成的功率模块,其铜线间距为200 μm。讨论了500 μm铝线和400 μm铜线在铜厚膜上的焊接工艺。装有1200伏IGBT的测试单元被建立起来。采用一种新型的银烧结浆料,在250℃和15 MPa的压力下对IGBT进行了吸附。这种浆料可以直接用在铜上。与DCB测试装置相比,厚膜测试样品的载流能力降低了10%。在持续数秒的有功脉冲试验中,两种技术的性能无显著差异。在25°C到150°C的循环中,使用400 μm铜线键合烧结芯片的测试设备的循环次数超过45万次。
{"title":"Copper thick-film substrates for power electronic applications","authors":"T. Blank, B. Leyrer, T. Maurer, M. Meisser, M. Bruns, M. Weber","doi":"10.1109/ESTC.2014.6962860","DOIUrl":"https://doi.org/10.1109/ESTC.2014.6962860","url":null,"abstract":"Substrates for high power electronic systems are dominated by DCB-technology. Recently, new copper thick-film pastes have been proposed for use as high power substrates. They are compatible with Al2O3- and pre-oxised AlN-substrates. This paper investigates production processes to build up highly reliable power modules and explores basis electrical and thermal properties of thick-film copper substrates. Fired copper film thicknesses of 300 μm have been produced by subsequent print-dry-fire cycles. Smooth surfaces and copper films with a density of about 70 % of bulk copper have been produced. A power module comprising of 650 V IGBTs, diodes and an intelligent hall sensor with copper traces and spaces of 200 μm is presented. Wire bonding processes on copper thick-films with 500 μm aluminium wire and 400 μm copper wire are discussed. Test units with a 1200 V IGBT were built up. The IGBT was attached at 250 °C and a pressure of 15 MPa using a novel silver sinter paste. This paste can be directly used on copper. The current-carrying capacity of the thick-film test samples was found to be reduced by 10% in comparison to the DCB test device. No significant difference was found in the performance of both technologies in active power pulse tests lasting a few seconds. The number of cycles for test devices with sintered chips, bonded with 400 μm copper wire bonds exceeded 450,000 cycles in a cycles from 25 °C up to 150 °C.","PeriodicalId":299981,"journal":{"name":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115708749","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 14
Understanding delamination for fast development of reliable packages for automotive applications. A consideration of adhesion by interlocking and anchoring 了解分层以快速开发汽车应用的可靠封装。通过联锁和锚固来考虑附着力
Pub Date : 2014-11-24 DOI: 10.1109/ESTC.2014.6962790
R. Pufall, M. Goroll, G. M. Reuther
Thermo-mechanical stress caused by the mismatch of coefficients of thermal expansion (CTE) and temperature variations remain a major concern for the reliability of semiconductor components. This issue is usually addressed by exposing the component to temperature cycling stress tests for a certain number of cycles, followed by e.g. scanning acoustic microscopy (SAM) to investigate delamination. Discussions about specific cycling conditions, e.g. using -65 °C/+175 °C instead of -55 °C/+150 °C for the minimum and maximum temperatures of the cycles or even using liquid-liquid instead of air to air cycling to speed up investigations [1], are often moot, because no real understanding of the effect of the cycling conditions on the component is available. Furthermore, it is almost a truism that testing alone does not suffice to ensure the reliability of a component. Reliability has to be built into the components from the beginning. As a consequence, the question should be turned around: it is not enough to look at delamination after a certain number of cycles in a stress test. The question is rather how the component should be designed and how the materials should be chosen to prevent delamination. Thus, the focus is changed from measuring delamination to measuring adhesion. In the previous paper [6] an approach for a better understanding of adhesion in terms of possible material combinations, temperature influence (ageing, delamination due to critical induced stress) and topology of interfaces was presented. This paper focuses on methods to reduce interfacial stresses in order to reduce the risk of delamination.
由热膨胀系数(CTE)的不匹配和温度变化引起的热机械应力仍然是影响半导体元件可靠性的主要问题。这个问题通常是通过将组件暴露在温度循环应力测试中进行一定次数的循环来解决的,然后通过扫描声学显微镜(SAM)来研究分层。关于特定循环条件的讨论,例如使用-65°C/+175°C代替-55°C/+150°C作为循环的最低和最高温度,甚至使用液-液而不是空气-空气循环来加速研究[1],通常是没有意义的,因为没有真正了解循环条件对组件的影响。此外,测试本身不足以确保组件的可靠性,这几乎是不言自明的。可靠性必须从一开始就内置到组件中。因此,问题应该反过来:在压力测试中经过一定次数的循环后,仅仅观察分层是不够的。问题是应该如何设计组件,以及应该如何选择材料来防止分层。因此,重点从测量分层转移到测量粘附。在之前的论文中,提出了一种从可能的材料组合、温度影响(老化、临界诱导应力引起的分层)和界面拓扑等方面更好地理解粘附的方法。本文着重探讨了降低界面应力以降低分层风险的方法。
{"title":"Understanding delamination for fast development of reliable packages for automotive applications. A consideration of adhesion by interlocking and anchoring","authors":"R. Pufall, M. Goroll, G. M. Reuther","doi":"10.1109/ESTC.2014.6962790","DOIUrl":"https://doi.org/10.1109/ESTC.2014.6962790","url":null,"abstract":"Thermo-mechanical stress caused by the mismatch of coefficients of thermal expansion (CTE) and temperature variations remain a major concern for the reliability of semiconductor components. This issue is usually addressed by exposing the component to temperature cycling stress tests for a certain number of cycles, followed by e.g. scanning acoustic microscopy (SAM) to investigate delamination. Discussions about specific cycling conditions, e.g. using -65 °C/+175 °C instead of -55 °C/+150 °C for the minimum and maximum temperatures of the cycles or even using liquid-liquid instead of air to air cycling to speed up investigations [1], are often moot, because no real understanding of the effect of the cycling conditions on the component is available. Furthermore, it is almost a truism that testing alone does not suffice to ensure the reliability of a component. Reliability has to be built into the components from the beginning. As a consequence, the question should be turned around: it is not enough to look at delamination after a certain number of cycles in a stress test. The question is rather how the component should be designed and how the materials should be chosen to prevent delamination. Thus, the focus is changed from measuring delamination to measuring adhesion. In the previous paper [6] an approach for a better understanding of adhesion in terms of possible material combinations, temperature influence (ageing, delamination due to critical induced stress) and topology of interfaces was presented. This paper focuses on methods to reduce interfacial stresses in order to reduce the risk of delamination.","PeriodicalId":299981,"journal":{"name":"Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124335926","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
期刊
Proceedings of the 5th Electronics System-integration Technology Conference (ESTC)
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