Atomic scale simulation of a junctionless silicon nanowire transistor

L. Ansari, B. Feldman, G. Fagas, J. Colinge, J. Greer
{"title":"Atomic scale simulation of a junctionless silicon nanowire transistor","authors":"L. Ansari, B. Feldman, G. Fagas, J. Colinge, J. Greer","doi":"10.1109/ULIS.2011.5757980","DOIUrl":null,"url":null,"abstract":"We have simulated silicon nanowire junctionless transistors with a 3 nm gate length within a Density Functional Theory (DFT) framework. We explored the response of transistors to source-drain bias, VDS, and gate voltage, Vg. Also, the effect of bulk and surface adatom in the wire cross section was evaluated.","PeriodicalId":146779,"journal":{"name":"Ulis 2011 Ultimate Integration on Silicon","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-03-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ulis 2011 Ultimate Integration on Silicon","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ULIS.2011.5757980","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

We have simulated silicon nanowire junctionless transistors with a 3 nm gate length within a Density Functional Theory (DFT) framework. We explored the response of transistors to source-drain bias, VDS, and gate voltage, Vg. Also, the effect of bulk and surface adatom in the wire cross section was evaluated.
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无结硅纳米线晶体管的原子尺度模拟
我们在密度泛函理论(DFT)框架内模拟了具有3nm栅极长度的硅纳米线无结晶体管。我们探索了晶体管对源漏偏置(VDS)和栅极电压(Vg)的响应。同时,对线材截面上体积和表面吸附原子的影响进行了评价。
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