{"title":"120 V super junction LDMOS transistor","authors":"S. Panigrahi, M. Baghini, U. Gogineni, F. Iravani","doi":"10.1109/EDSSC.2013.6628135","DOIUrl":null,"url":null,"abstract":"Super junction (SJ) is one of the emerging principles used in high-voltage high-power semiconductor devices. Implementation of SJ principle with charge balance in the pillars has overcome the “Silicon-limit”. SJ principle demands formation of back-to-back reverse biased p-n pillars. Main technology constraint is formation of narrow pillars with high aspect ratio and charge imbalance in these pillars. We propose a method to obtain high breakdown voltage in planar SJ-LDMOS by reducing the effect of charge imbalance at the drain end without reducing width of the pillars and no significant change in ION. The breakdown voltage of 120 V in a HV CMOS technology with tox of 13nm is achieved without ION degradation, as compared to 100 V conventional LDMOS device.","PeriodicalId":333267,"journal":{"name":"2013 IEEE International Conference of Electron Devices and Solid-state Circuits","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2013-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE International Conference of Electron Devices and Solid-state Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDSSC.2013.6628135","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
Super junction (SJ) is one of the emerging principles used in high-voltage high-power semiconductor devices. Implementation of SJ principle with charge balance in the pillars has overcome the “Silicon-limit”. SJ principle demands formation of back-to-back reverse biased p-n pillars. Main technology constraint is formation of narrow pillars with high aspect ratio and charge imbalance in these pillars. We propose a method to obtain high breakdown voltage in planar SJ-LDMOS by reducing the effect of charge imbalance at the drain end without reducing width of the pillars and no significant change in ION. The breakdown voltage of 120 V in a HV CMOS technology with tox of 13nm is achieved without ION degradation, as compared to 100 V conventional LDMOS device.