{"title":"Perimeter effect in advanced self-aligned bipolar transistor","authors":"S. Sawada","doi":"10.1109/BIPOL.1988.51080","DOIUrl":null,"url":null,"abstract":"Emitter perimeter effects in advanced self-aligned bipolar transistors utilizing a sidewall spacer technology have been studied. Collector-emitter punchthrough, emitter current crowding and base resistance increment due to insufficient extrinsic-intrinsic base overlap in the emitter periphery, and the lowering of cutoff frequency and the tunneling current due to the lateral encroachment of the extrinsic-base into the intrinsic-base area are discussed. Particular emphasis is placed on the dependence of the degree of the extrinsic-intrinsic base overlap on the sidewall spacer length and the extrinsic-base profile. The balance between increasing the base resistance increment and decreasing the cutoff frequency is a device design tradeoff, as is the balance between the perimeter punchthrough current and the perimeter tunneling current.<<ETX>>","PeriodicalId":302949,"journal":{"name":"Proceedings of the 1988 Bipolar Circuits and Technology Meeting,","volume":"55 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 1988 Bipolar Circuits and Technology Meeting,","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BIPOL.1988.51080","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
Emitter perimeter effects in advanced self-aligned bipolar transistors utilizing a sidewall spacer technology have been studied. Collector-emitter punchthrough, emitter current crowding and base resistance increment due to insufficient extrinsic-intrinsic base overlap in the emitter periphery, and the lowering of cutoff frequency and the tunneling current due to the lateral encroachment of the extrinsic-base into the intrinsic-base area are discussed. Particular emphasis is placed on the dependence of the degree of the extrinsic-intrinsic base overlap on the sidewall spacer length and the extrinsic-base profile. The balance between increasing the base resistance increment and decreasing the cutoff frequency is a device design tradeoff, as is the balance between the perimeter punchthrough current and the perimeter tunneling current.<>