{"title":"Fabrication tolerant silicon MZI filter","authors":"S. Dwivedi, H. D’heer, W. Bogaerts","doi":"10.1109/GROUP4.2014.6961969","DOIUrl":null,"url":null,"abstract":"A compact fabrication tolerant MZI filter is demonstrated. The measured device shows a 20-fold improved tolerance to systematic waveguide linewidth variations, with a wavelength shift of less than 60 pm/nm linewidth change.","PeriodicalId":364162,"journal":{"name":"11th International Conference on Group IV Photonics (GFP)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"11th International Conference on Group IV Photonics (GFP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GROUP4.2014.6961969","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
A compact fabrication tolerant MZI filter is demonstrated. The measured device shows a 20-fold improved tolerance to systematic waveguide linewidth variations, with a wavelength shift of less than 60 pm/nm linewidth change.
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