M. Mugnier, S. K. Manhas, D. Chandra Sekhar, S. Krishnan, R. Cross, E. M. Sankara Narayanan, M. M. De Souza, D. Flores, M. Vellvehí, J. Millán
{"title":"Degradation behaviour of polysilicon high voltage thin film transistors","authors":"M. Mugnier, S. K. Manhas, D. Chandra Sekhar, S. Krishnan, R. Cross, E. M. Sankara Narayanan, M. M. De Souza, D. Flores, M. Vellvehí, J. Millán","doi":"10.1109/IPFA.2002.1025666","DOIUrl":null,"url":null,"abstract":"The degradation characteristics of polycrystalline silicon Off-set Drain High Voltage Thin Film Transistors (OD-HVTFTs) are reported. The results demonstrate a pronounced kink in the transfer characteristics at high gate bias, due to degradation of the offset region. This effect is particularly noticeable in non-hydrogenated HVTFTs. Annealing of devices in atmospheric ambient after stress shows temperature dependent recovery.","PeriodicalId":328714,"journal":{"name":"Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.02TH8614)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.02TH8614)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.2002.1025666","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The degradation characteristics of polycrystalline silicon Off-set Drain High Voltage Thin Film Transistors (OD-HVTFTs) are reported. The results demonstrate a pronounced kink in the transfer characteristics at high gate bias, due to degradation of the offset region. This effect is particularly noticeable in non-hydrogenated HVTFTs. Annealing of devices in atmospheric ambient after stress shows temperature dependent recovery.
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