Controlling Structure and Transport in Halide Perovskite Films Using Chemical Vapor Deposition

Abstract

No other semiconductor has shown such a rapid increase in solar cell power conversion efficiencies over a period of 10 years as the organic-inorganic hybrid perovskites. Chemical vapor deposition (CVD), a low-cost and a scalable deposition technique, allows the growth of perovskite thin films without the use of solvents. We will discuss a two-step CVD technique that yields air-stable methylammonium (MA) lead iodide and mixed halide films, while also inducing the stable cubic phase at room temperature and at pressures as low as 0.25 GPa. Temperature and pressure-dependent synchrotron-based x-ray diffraction studies from MA lead iodide and mixed halide films will be presented, and these results will be further correlated with transport properties.