{"title":"Gate antenna structures for monitoring oxide quality and reliability","authors":"S. Nariani, C. Gabriel, D. Pramanik, K. Ng","doi":"10.1109/ICMTS.1995.513952","DOIUrl":null,"url":null,"abstract":"Gate antenna structures have been developed to detect charge induced process damage to sub-micron gate oxide. For the first time, this damage is correlated with product failure due to gate oxide in accelerated life testing. These antenna structures are thus proven to be useful for wafer level gate oxide reliability screening.","PeriodicalId":432935,"journal":{"name":"Proceedings International Conference on Microelectronic Test Structures","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-03-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings International Conference on Microelectronic Test Structures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.1995.513952","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
Gate antenna structures have been developed to detect charge induced process damage to sub-micron gate oxide. For the first time, this damage is correlated with product failure due to gate oxide in accelerated life testing. These antenna structures are thus proven to be useful for wafer level gate oxide reliability screening.
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