C. Munro, A. Gundlach, J. Stevenson, D. W. Travis, S. Smith, N. Rankin, A. Walton
{"title":"The fabrication of electrical linewidth structures capable of TEM measurement using standard <100> wafers","authors":"C. Munro, A. Gundlach, J. Stevenson, D. W. Travis, S. Smith, N. Rankin, A. Walton","doi":"10.1109/ICMTS.1999.766208","DOIUrl":null,"url":null,"abstract":"This paper presents details of a process for fabricating electrical linewidth structures over etched windows so that they potentially can be inspected with a TEM. These ELISTEMs (electrical linewidth structures for TEM) are fabricated using standard <100> silicon wafers. Measurements are compared with those obtained for conventional linewidth structures.","PeriodicalId":273071,"journal":{"name":"ICMTS 1999. Proceedings of 1999 International Conference on Microelectronic Test Structures (Cat. No.99CH36307)","volume":"62 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICMTS 1999. Proceedings of 1999 International Conference on Microelectronic Test Structures (Cat. No.99CH36307)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.1999.766208","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
This paper presents details of a process for fabricating electrical linewidth structures over etched windows so that they potentially can be inspected with a TEM. These ELISTEMs (electrical linewidth structures for TEM) are fabricated using standard <100> silicon wafers. Measurements are compared with those obtained for conventional linewidth structures.
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